Check patentability & draft patents in minutes with Patsnap Eureka AI!

Connection base sheet for double discs and operation method

A technology for connecting bases and substrates, applied in the field of double-disc connecting substrate devices, can solve the problems of waste of substrates, poor versatility, low utilization rate, etc., and achieve the effects of increasing utilization efficiency, convenient loading and unloading, and flexible use.

Inactive Publication Date: 2005-04-27
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The effective part of the coating is located in a circle with a radius of 116mm to 125mm, and the area is only 68cm 2 , occupying only 730cm of total substrate area 2 9%, the utilization rate is very low, and the versatility is relatively poor, and it also causes a very large waste of substrates

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Connection base sheet for double discs and operation method
  • Connection base sheet for double discs and operation method
  • Connection base sheet for double discs and operation method

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0033] Example 1 Realizes the installation of a circular substrate by means of a double disc connection substrate device

[0034] According to the shape of the substrate, the designed external plate such as figure 2 shown. image 3 It is the cover plate of the substrate, the size is the same as the shape of the substrate, the inner diameter is slightly smaller, the outer diameter is slightly larger, and it is hollow. There are more than two through holes 31 in the ring corresponding to the screw holes 23 of the outer connection plate 2, and are used for fixing screws. Its purpose is to prevent the substrate from coming out of the external disc 2 . Then, you can follow the previous steps to complete the installation.

example 2

[0035] Example 2 Realizes the installation of elliptical substrates by means of a double-disk connection substrate device

[0036] According to the shape of the substrate, the designed external plate such as Figure 4 shown. Since the cover plate is very simple, it is omitted here. Its purpose is to prevent the substrate from coming out of the external tray. put substrate in Figure 4 In the substrate groove 42 shown, the installation can be completed according to the aforementioned steps.

example 3

[0037] Example 3 Realize the Installation of a Rectangular Substrate by Using a Double Disk Connection Substrate Device

[0038] According to the shape of the substrate, the designed external plate such as Figure 5 shown. Since the corresponding cover plate is very simple, it is omitted here. Its purpose is to prevent the substrate from coming out of the external tray. put substrate in Figure 5 In the substrate groove 52 shown, the installation can be completed according to the aforementioned steps.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

A dual disk-substrate device used for Veeco RE ion sputter coating machine in order to increase the coated area from 68 to 660 sq.cm is composed of fixed disk with central hole for axle sleeve and N blind screw holes in marginal region, external disk with relative N through hole and a substrate recess for holding the substrate in it, and the cover plate of substrate. Said substrate and its cover plate have relative screw holes and through holes. Its advantage is flexible application.

Description

technical field [0001] The invention relates to a high-performance coating machine, in particular to how to improve the utilization rate of the equipment, expand the coating area of ​​the substrate, and make the equipment have greater practicability. Background technique [0002] Veeco radio frequency ion beam sputtering coating machine is specially developed by American Veeco Company to meet the needs of optical communication thin films, and has a very strong pertinence. The equipment has the advantages of high degree of automation, compact structure of the prepared film, no wavelength drift and low loss, etc., and can plate films with special requirements (such as irregular film systems, ultra-low loss films, and ultra-thick films). However, due to its special design, the application range is very narrow, not only the size of the prepared thin film sample is small, but also has special requirements for the installation position. The substrate device of this equipment is a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/14C23C14/50
Inventor 王英剑葛建忠贺洪波范正修
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More