Photosensitive ceramic blank plate, ceramic package and process for producing same
A manufacturing method and photosensitivity technology, applied in electrical components, printed circuits, etc., can solve the problems of pattern peeling, photosensitivity and resolution, high precision, etc.
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Embodiment 1
[0267] The plate thickness was 100 μm, exposure was performed from one side, and shower image development was performed at 30°C. Patterning is to spread the paste all over the ceramic blank and fill the via holes with conductors at the same time.
[0268] Good via hole shape was obtained after firing.
Embodiment 2
[0270] The thickness of the plate is 200 μm, one-sided exposure is performed sequentially from both sides, and spray development is performed at 30°C. The paste is applied to the entire surface of the ceramic blank, and at the same time, the conductor filling of the via hole is performed to form a pattern.
[0271] A good via hole shape was also obtained after firing.
Embodiment 3
[0273] The thickness of the plate is 200 μm, both sides are exposed at the same time, and are developed by spraying at 30°C. Spread the paste on the film to form a via hole and then transfer it to a ceramic blank to form a pattern. As the transfer film, a polyester film with a peel strength of 5N / 24mm was used.
[0274] A good via hole shape was also obtained after firing.
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