Substrate processing device, liquid processing device and liquid processing method

Abstract

The invention aims to cutting processing liquid supplied to a substrate being processed on a carrying path laid in the horizontal direction from the substrate efficiently in a short time. When a substrate G reaches a specified position on a carrying path 108, rotation of a carrying roller 138 is interrupted to stop the substrate G. A drive section 188 is operated immediately thereafter to elevate an elevating / lowering shaft 186. Consequently, a base plate 182 and a lift pin 184 are raised too, and the substrate G is pushed up by the lift pin 184 above the carrying path 108. Subsequently, the base plate 182 is turned rearward at a specified angle about a shaft 196 extending in the widthwise direction of the carrying path 108. Consequently, a lift pin 192, a stopper member 194, and the substrate G incline rearward by the same angle on the carrying path 108. The substrate G is received by the stopper member 194 and liquid Q on the substrate G slips gravitationally rearward on the inclining face of the substrate and drops to the outside of the substrate. The liquid Q dropped from the substrate G is received in a pan 130.

Description

technical field [0001] The invention relates to a substrate processing device for carrying out a single or a series of liquid processing procedures while transporting the processed substrate horizontally. The present invention relates to a liquid treatment device and a liquid treatment method for performing liquid treatment such as developing treatment on a substrate such as a liquid crystal display device (LCD) glass substrate. Background technique [0002] Recently, in the resist coating and development processing system for LCD (liquid crystal display) manufacturing, as a development method that can advantageously cope with the increase in the size of LCD substrates, a conveyor system composed of conveyor rollers or conveyor belts is laid in the horizontal direction. The so-called advection method, in which a series of development processing steps such as developing, rinsing, and drying are carried out while conveying LCD substrates on the path, is attracting attention. ...

AI Technical Summary

Problems solved by technology

In the development process of the LCD substrate, when the developer is poured from the LCD substrate by tilting the LCD substrate, if the developer cannot be quickly supplied with pure water to the LCD substrate to clean the residue of the developer and stop the development reaction, Then there will be problems of uneven development or deterioration of line width uniformity

[0007] Therefore, in order to supply the rinsing liquid to such a large LCD substrate, the LCD substrate is conveyed at a high speed in an inclined posture, due to the mechanical load applied to the LCD substrate or the load of the conveying device, the LCD substrate in the case of high-speed conveying of the LCD substrate. Various reasons such as stopping conditions are difficult

For example, in the case of high-speed transmission of the LCD substrate, the LCD substrate does not stop at the specified position afterwards, and the LCD substrate is damaged when it passes the line. When the LCD substrate is stopped in an emergency, a large load is applied to the LCD substrate, and the LCD substrate is damaged.

On the other hand, when the transfer speed of the LCD substrate is slow, there is a problem that the photocopying of the developing device will inevitably become larger.

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