Substrate processing device, liquid processing device and liquid processing method

A substrate processing and processing liquid technology, applied in optics, instruments, electrical components, etc., can solve problems such as difficult stop conditions, enlarged photocopying of developing devices, and large loads on LCD substrates

Inactive Publication Date: 2006-07-05
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the development process of the LCD substrate, when the developer is poured from the LCD substrate by tilting the LCD substrate, if the developer cannot be quickly supplied with pure water to the LCD substrate to clean the residue of the developer and stop the development reaction, Then there will be problems of uneven development or deterioration of line width uniformity
[0007] Therefore, in order to supply the rinsing liquid to such a large LCD substrate, the LCD substrate is conveyed at a high speed in an inclined posture, due to the mechanical load applied to the LCD substrate or the load of the conveying device, the LCD substrate in the case of high-speed conveying of the LCD substrate. Various reasons such as stopping conditions are difficult
For example, in the case of high-speed transmission of the LCD substrate, the LCD substrate does not stop at the specified position afterwards, and the LCD substrate is damaged when it passes the line. When the LCD substrate is stopped in an emergency, a large load is applied to the LCD substrate, and the LCD substrate is damaged.
On the other hand, when the transfer speed of the LCD substrate is slow, there is a problem that the photocopying of the developing device will inevitably become larger.

Method used

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  • Substrate processing device, liquid processing device and liquid processing method
  • Substrate processing device, liquid processing device and liquid processing method
  • Substrate processing device, liquid processing device and liquid processing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] figure 1 A coating development processing system is shown as an example of the structure to which the developing processing apparatus of the present invention is applied. The coating and development processing system 10 is installed in a clean room, and for example, an LCD substrate is used as a substrate to be processed. In the LCD manufacturing process, cleaning, resist coating, pre-drying, and developing are performed in the lithography process. And post-drying and other treatments. Exposure processing is performed by an external exposure device 12 provided adjacent to the system.

[0074] In this coating and development processing system 10, a horizontally long processing station (P / S) 16 is arranged at the center, and a disc cartridge station (C / S) 14 and an interface station ( I / F) 18.

[0075] The disk cartridge station (C / S) 10 is the disk cartridge loading and unloading end of the system 10. It is equipped with multi-stage overlapping substrates G and loads ...

Embodiment 2

[0178] Embodiments of the present invention will be described in detail below with reference to the drawings. Here, in this embodiment, a case where the present invention is applied to a developing unit (DEV) for developing an exposed LCD substrate will be described as an example. Figure 19 It is a schematic plan view showing a resist coating and development processing system having a development processing unit (DEV) as an embodiment of the present invention, and continuously performing resist coating and development processing from resist film formation to development processing.

[0179] This resist coating and development processing system 400 has: a disk cartridge table (carry-in and carry-out part) 301 on which a disk cartridge C accommodating a plurality of LCD substrates G is loaded; a processing table (processing part) 302 has a plurality of processing units, A series of processes including resist coating and development are performed on the LCD substrate G; the inte...

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Abstract

The invention aims to cutting processing liquid supplied to a substrate being processed on a carrying path laid in the horizontal direction from the substrate efficiently in a short time. When a substrate G reaches a specified position on a carrying path 108, rotation of a carrying roller 138 is interrupted to stop the substrate G. A drive section 188 is operated immediately thereafter to elevate an elevating / lowering shaft 186. Consequently, a base plate 182 and a lift pin 184 are raised too, and the substrate G is pushed up by the lift pin 184 above the carrying path 108. Subsequently, the base plate 182 is turned rearward at a specified angle about a shaft 196 extending in the widthwise direction of the carrying path 108. Consequently, a lift pin 192, a stopper member 194, and the substrate G incline rearward by the same angle on the carrying path 108. The substrate G is received by the stopper member 194 and liquid Q on the substrate G slips gravitationally rearward on the inclining face of the substrate and drops to the outside of the substrate. The liquid Q dropped from the substrate G is received in a pan 130.

Description

technical field [0001] The invention relates to a substrate processing device for carrying out a single or a series of liquid processing procedures while transporting the processed substrate horizontally. The present invention relates to a liquid treatment device and a liquid treatment method for performing liquid treatment such as developing treatment on a substrate such as a liquid crystal display device (LCD) glass substrate. Background technique [0002] Recently, in the resist coating and development processing system for LCD (liquid crystal display) manufacturing, as a development method that can advantageously cope with the increase in the size of LCD substrates, a conveyor system composed of conveyor rollers or conveyor belts is laid in the horizontal direction. The so-called advection method, in which a series of development processing steps such as developing, rinsing, and drying are carried out while conveying LCD substrates on the path, is attracting attention. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/26G02F1/1333H01L21/027H01L21/31H01L21/00
CPCG02F1/1303G02F1/1316H01L21/6715H01L21/67742
Inventor 立山清久元田公男佐田彻也宫崎一仁筱木武虎
Owner TOKYO ELECTRON LTD
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