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Defect knowledge library

A knowledge base, defect technology, applied in the field of defect knowledge base

Inactive Publication Date: 2003-01-22
APPLIED MATERIALS INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For example, certain defects may arise when a specific container chamber becomes dirty

Method used

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Embodiment Construction

[0025] One embodiment of defect knowledge base system 186 forms part of defect source identifier 100 in FIG. 1 . Defect source identifier 100 identifies defects in wafers processed by wafer processing system 102 , determines the source of the defects, and proposes solutions to mitigate each defect. The wafer processing system 102 includes one or more processing units 103 . Each processing unit 103 (also referred to herein as a processing tool) is used to perform such processes as chemical vapor deposition (CVD), physical vapor deposition (PVD), electrochemical plating (ECP), chemical mechanical polishing (CMP), Chemical deposition, exemplary processes of other known deposition or etching processes.

[0026] Defect knowledge base (DKL) database system 186 stores semiconductor wafer defect case history in DKL database 190 . Store, organize and access case history information through DKL software 188. A remote user (client 104 ) of defect source identifier 100 may access this ...

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Abstract

A method and associated apparatus for creating a defect knowledge library containing case study information of wafer defects on semiconductor wafers. The method comprises creating a database entry that contains a case study of a specific defect including defect information that comprises one or more defect images and storing the database entry for subsequent access. The database entries are stored on a server and are accessible by a plurality of clients.

Description

[0001] Cross References to Related Applications [0002] This patent application claims priority to US Provisional Patent Application Serial No. 60 / 237,297, filed October 2, 2000, which is incorporated herein by reference. This patent application contains subject matter related to US Patent Application Nos. 09 / 905,313, 09 / 905,514, and 09 / 905,607, filed concurrently on July 13, 2001, which are hereby incorporated by reference in their entirety. technical field [0003] The present invention generally relates to methods or related apparatus for defect analysis in semiconductor wafer processing systems. More particularly, the invention relates to databases that store images and other information about defects on semiconductor wafers. Background technique [0004] Semiconductor wafers are prone to defects during processing. Defects can occur at any stage of processing a wafer when integrated circuits are formed thereon. Manufacturers of integrated circuits typically maintain ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/66
CPCH01L22/20
Inventor 阿莫斯·多尔马亚·拉德辛斯基
Owner APPLIED MATERIALS INC