Objective table apparatus and exposure apparatus

Abstract

A stage apparatus is provided with a guide member and a driving device. The guide member that guides a stage body holding a substrate in a way capable of moving in a first direction moves in a second direction above a base. The driving device drives the stage body moves towards the first direction. A follower stage that is arranged between the guide member and the base is connected to a part of the driving device and moves towards the second direction with the guide member. The stage apparatus can be achieved compactly, and the dust caused by the source-supplying member can be obstructed without the damage of the control-ability of the driving device.

Description

technical field [0001] The present invention relates to a stage device that moves a stage body holding a substrate in multiple directions, and relates to an exposure device that uses a photomask and a substrate held on the stage to perform exposure processing, And it is especially related to a stage device and an exposure device suitable for lithography when manufacturing components such as semiconductor integrated circuits or liquid crystal displays. Background technique [0002] Conventionally, in the manufacturing process of liquid crystal displays (collectively referred to as flat panel displays), for example, in order to form transistors or diodes on a substrate (glass substrate), an exposure device is often used. In this exposure device, the substrate coated with a photosensitive agent is placed on the holder of the stage device, and the fine circuit pattern drawn on the photomask is transferred to the substrate through an optical system such as a projection lens. On ...

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Problems solved by technology

[0010] Moreover, when the main stage moves in a direction different from the driven direction of the driven stage, these resource supply members will rub against each other and generate dust when moving, and foreign matter will adhere to the substrate, thereby causing substrate exposure. Risk of defective products handled

Here, although it is considered to cover the above-mentioned resource supply member with a cover to suppress dust generation, in the moving direction of the cover, the vibration accompanying the movement of the cover becomes an external disturbance of the control system, thus causing high-speed and high-precision positioning. obstacle

[0011] On the other hand, in the above-mentioned stage device, the substrate is arranged on the flat support 98, although the flat support 98 can be rotated at a small angle in the substrate surface (horizontal plane) to perform alignment, yet, due to additional needs, use The complex mechanism of the rotation of the large-scale plate support 98 requires time-consuming precise positioning, and countermeasures are required to prevent deviation after positioning, and there is also concern about the deterioration of the flatness of the plate support 98

[0012] Furthermore, in an apparatus that continuously exposes substrates in response to an increase in size, the number of boxes that have to be disassembled and transported is expected to increase due to restrictions on the weight of the transport and the size of the equipment due to the increase in the size of the stage.

In such an occasion, you need to worry about prolonging the time for on-site assembly

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