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Thin film material assembled by templet and preparation method

A thin-film material and template technology, which is applied in the field of template-assembled thin-film materials and its preparation, can solve the problems of difficult control of the process, complex manufacturing equipment, and low production efficiency, and achieve easy control of the process, low manufacturing cost, and high manufacturing efficiency. Effect

Inactive Publication Date: 2004-10-27
周照耀
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Magneto-optical magneto-optical storage media rely on the thermomagnetic effect of magneto-optic and the Kerr (Kerr) magneto-optical effect of reflected polarized light to record and read information. The magneto-optical storage film material is obtained by sputtering, and the manufacturing equipment is complicated. , the process is not easy to control, the production efficiency is low, and the cost is high

Method used

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  • Thin film material assembled by templet and preparation method

Examples

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Effect test

Embodiment 1

[0031] The present invention adopts the mold as shown in Figure 1 to prepare the template assembly film material, as can be seen from Figure 1, the mold includes a female mold 2, an upper male mold 1, a lower male mold 4, a coil 3, and the lower male mold 4 is inserted A mold cavity 7 is formed in the female mold 2, and the upper male mold 1 is set opposite to the mold cavity 7, and can be inserted into the mold cavity 7 to make the mold cavity 7 a closed space. The female mold 2 is provided with a heating wire 6 and a cooling channel 5, The female mold 2 is surrounded by a coil 3 for forming a magnetic field.

[0032]Using a metal mold for forming a CD disc, form concave holes with a diameter of 650 nanometers and a depth of 600 nanometers at all information recording positions on the channel of the polycarbonate (PC) disc substrate, thereby preparing a multi-micro-concave circle Sheet template; magnetizable ferric oxide powder with a particle size of 400-500 nanometers is de...

Embodiment 2

[0034] This embodiment is the same as Embodiment 1 except the following operation process: the female mold 2 is provided with a vacuuming hole. After the liquid glue dispersed with ferric oxide powder is input into the mold cavity 7, the upper male mold 1 goes down and is inserted into the mold cavity 7 to form the mold cavity 7 into a closed space, and then the mold cavity 7 is pumped through the vacuuming channel on the female mold 2. vacuum.

Embodiment 3

[0036] Present embodiment is identical with embodiment 1 except following process: the powder material that adopts is the yttrium-iron garnet (Y 3 Fe 5 o 12 ) powder to prepare a template-assembled film material that can be used for magneto-optical recording.

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Abstract

The method includes steps: preparing templet possessing multiple tiny concave spots on surface; spreading around powder to liquid, powder following liquid to enter to tiny concave spots on porous surface, under action of applying external field; concreting powder on the tiny concave spots on porous surface by solidifying liquid so as to obtain thin film material assembled by templet. Another modes are: making liquid enter tiny concave spots first, then adding powder to tiny concave spots under action of applying external field; or under action of applying external field, adding powder to tiny concave spots first, making liquid enter tiny concave spots the. Features of the invention are: simple equipment, easy of operation, thin film material possessing high information record density repeated reading / writing more many times etc.

Description

technical field [0001] The invention relates to membrane material technology, in particular to a template assembly membrane material and a preparation method thereof. Background technique [0002] The main methods of manufacturing thin films include physical vapor deposition (PVD) and chemical vapor deposition (CVD). Physical vapor deposition technology refers to the use of certain physical processes, such as thermal evaporation of substances or when atoms on the surface of substances are bombarded by ions or particles. The phenomenon of sputtering and other phenomena realizes the controllable atomic transfer process of the material from the source material to the thin film. Physical vapor deposition techniques include evaporation, sputtering, ion plating, reactive evaporation deposition, ion beam assisted deposition, and ion cluster beam deposition. Chemical vapor deposition technology is a technology that uses gaseous precursor reactants to form ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/84G11B7/26
Inventor 周照耀
Owner 周照耀