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Informaton recording thin film material and its prepn. method

A technology for information recording and thin film materials, applied in the field of film materials, can solve the problems of difficult to effectively control the thin film manufacturing process, uneven distribution of magnetic powder, low magnetic recording density, etc., to improve reliability and information transmission speed, low manufacturing cost , the effect of a wide range of applications

Inactive Publication Date: 2007-02-14
周照耀
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned vapor deposition process includes the nucleation, growth, and film formation process of the film. The required deposition time is long, the device structure used is complex and expensive, the film manufacturing process is difficult to effectively control, and the production efficiency is low.
Another method of manufacturing film is to apply a coating on the substrate material. Taking the manufacture of magnetic tape or floppy disk as an example, the surface-treated magnetic powder slurry is coated on the surface of the PET polyester substrate, and then the magnetic field is oriented. The main disadvantages of this coating method are low magnetic recording density, small information storage capacity, uneven distribution of magnetic powder, and great randomness.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] The aluminum-magnesium alloy disc (i.e. the substrate) with a central hole is used as the substrate, and polished to achieve a lower surface roughness. On the aluminum-magnesium alloy substrate, a layer of NiP alloy layer is first deposited by electroless plating. The structure of a coating is amorphous and not ferromagnetic. Then, after further polishing the NiP alloy layer, a film of iron with a thickness of 100 nanometers is deposited on the NiP alloy layer of the wafer by electroplating, and a magnetic field is applied in the electroplating tank to make the magnetic material in the deposition process. Get the pole orientation. Then cover the ferromagnetic film of the wafer with photoresist, and then use a CD recorder to expose and record all the information recording positions on the wafer. The photoresist that has been exposed to light will harden and form spots, while the part that is not exposed to light will remain the same , and then develop the wafer with spo...

Embodiment 2

[0028] This embodiment is the same as Embodiment 1 except the following operating conditions: all operating processes are carried out in a vacuum chamber.

Embodiment 3

[0030] A disc is made of light-transmitting glass, a layer of chrome is plated on the surface of the glass disc, and then the glass disc is coated with photoresist to make a recordable disc; Expose and record the spot array at the information recording position; then develop and etch the glass wafer to make a mask.

[0031] The aluminum-magnesium alloy wafer is used as the substrate and polished to achieve extremely low surface roughness. On the aluminum-magnesium alloy substrate, a layer of NiP alloy layer is first deposited by electroless plating. The structure of this coating is amorphous. Not ferromagnetic. Then after the NiP alloy layer is further polished, on the NiP alloy layer of the wafer, adopt the method deposition of electroplating (the method for electrolytic deposition) one deck of 100 nanometers thick iron film, apply magnetic field in the electroplating tank, so that Magnetic materials acquire a magnetic pole orientation during deposition. Then, after the fer...

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PUM

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Abstract

The method includes steps: (1) preparing substrate; (2) forming thin film on the substrate; (3) covering photoresist on the said film; (4) exposing photoresist to make spot array by burning device; (5) carrying out development; (6) carrying out etching after development so as to form columnar raised tiny array on film layer for information to be recorded. Features are: easy of controlling processing procedure, unlimited number of repeated reading / writing etc.

Description

technical field [0001] The invention relates to film material technology, in particular to an information recording film material and a preparation method thereof. Background technique [0002] The main methods of manufacturing thin films include physical vapor deposition (PVD) and chemical vapor deposition (CVD). Physical vapor deposition technology refers to the use of certain physical processes, such as thermal evaporation of substances or when atoms on the surface of substances are bombarded by ions or particles. The phenomenon of sputtering and other phenomena realizes the controllable atomic transfer process of the material from the source material to the thin film. Physical vapor deposition techniques include evaporation, sputtering, ion plating, reactive evaporation deposition, ion beam assisted deposition, and ion cluster beam deposition. Chemical vapor deposition technology is a technology that uses gaseous precursor reactants to form s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G11B7/26
Inventor 周照耀
Owner 周照耀