Digital shape spliting mask prodn. method for microoptical element

A manufacturing method and micro-optics technology, applied in optics, micro-lithography exposure equipment, originals for photomechanical processing, etc., can solve the problems of gray-scale mask edge sharpness decline, etc., to improve edge sharpness, avoid The effect of different flipping frequencies and reducing difficulty

Inactive Publication Date: 2005-01-12
NANCHANG AERONAUTICAL ENG INST +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to overcome the defect that the low-pass filter characteristic of the narrowing lens causes the edge sharpness of the gray scale mask to decrease in the process of making the gray scale mask by the electric addressing spatial light modulator, and to provide a kind of reducing projection lens Influence of low-pass filtering characteristics on lithography exposure, a method for making a digital fractal mask for micro-optical devices that improves the resolution of lithography images, which can reduce the high-frequency energy loss caused by the lens to within 0.1%

Method used

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  • Digital shape spliting mask prodn. method for microoptical element
  • Digital shape spliting mask prodn. method for microoptical element
  • Digital shape spliting mask prodn. method for microoptical element

Examples

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Effect test

Embodiment 1

[0024] A digital fractal mask manufacturing method for a digital micromirror device high-frequency grayscale mask pattern:

[0025] (1) Sampling by a fixed low-frequency period, the low-frequency sampling period is twice the minimum period of the original high-frequency mask pattern, thereby decomposing a high-frequency mask pattern into two low-frequency masks of equal size;

[0026] (2) Align and superimpose the two low-frequency masks along the direction perpendicular to the plane where the masks are located, and the sum of the gray value of the corresponding position after the superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;

[0027] (3) Through the real-time mask technology, the two low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 2 of the exposure time of the original mask, thereby recovering the original high-frequency mask pattern.

Embodiment 2

[0029] A digital fractal mask manufacturing method for a digital micromirror device high-frequency grayscale mask pattern:

[0030] (1) Sampling by a fixed low-frequency period, the low-frequency sampling period is three times the minimum period of the original high-frequency mask pattern, thereby decomposing a high-frequency mask pattern into three low-frequency masks of equal size;

[0031] (2) Align and superimpose these 3 low-frequency masks along the direction perpendicular to the plane where the masks are located, and the sum of the gray value of the corresponding position after the superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;

[0032] (3) Through the real-time mask technology, the three low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 3 of the exposure time of the original mask, so as to restore the original high-frequency mask pattern.

Embodiment 3

[0034] A digital fractal mask manufacturing method for an eight-step grayscale mask pattern of a digital micromirror device:

[0035] (1) directly according to the step number 8 fractal, the quantity of the fractal low-frequency mask is the step number 8, thereby decomposing a high-frequency mask figure into step number 8 equal-sized low-frequency masks;

[0036] (2) Align and superimpose these 8 low-frequency masks along the direction perpendicular to the plane where the mask is located, and the gray value of the corresponding position after superimposition is equal to the gray value of the corresponding position of the original high-frequency mask;

[0037] (3) Through the real-time mask technology, the eight low-frequency masks are sequentially exposed, and the exposure time of each is 1 / 8 of the exposure time of the original mask, thereby recovering the original high-frequency mask pattern.

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Abstract

The method includes following step: decomposing one frame of mask pattern in high frequency into m frames of mask pattern in low frequency without changing size; superposing m frames of mask pattern in low frequency, and superposed gray value is equal to original mask pattern in high frequency at same position; exposing m frames of mask pattern in sequence, and time of exposure for each frame is 1/m of original time of exposure; thus, original mask pattern in high frequency is recovered. Advantages are: (1) reducing influence on photo etching exposure caused by lowpass filtering characteristic of final minification projection lens, reducing high frequency loss to lower than 0.1%, improving edge sharpness, improving resolution of spatial light modulator electrical addressed; (2) solving alignment difficulty; (3) reducing difficulty for preparing mask pattern; (4) easy to select linearity range of exposure.

Description

technical field [0001] The invention relates to a manufacturing method of a micro-optical device, in particular to a method for manufacturing a digital fractal mask of a micro-optical device. Background technique [0002] The fabrication method of micro-optical devices has become a hot topic in the field of micro-optics at home and abroad in recent years. Various design and analysis methods related to micro-optical devices have gradually matured, but the corresponding large-scale, high-efficiency, and rapid production and replication technologies are restricted by various conditions, especially in China, and have not yet reached the practical stage. The emerging technology of making grayscale masks using electrically addressable spatial light modulators has opened up a new way for large-scale, fast and flexible fabrication of stepped or continuous micro-optical devices. This technology can realize both real-time mask making and laser fast direct writing. In a system that u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/38G03F7/20
Inventor 吕海宝漆新民谌廷政高益庆罗武胜周卫红朱小进周鞠宁罗宁宁
Owner NANCHANG AERONAUTICAL ENG INST
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