Device and method for nondestructive inspection on semiconductor device
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- NEC ELECTRONICS CORP
- Publication Date
- 2005-01-26
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to apparatus and methods for non-destructive inspection of chips of semiconductor devices, and in particular to non-destructive inspection for detecting electrically active defects. The present invention also relates to a semiconductor device suitable for non-destructive inspection, and a method of manufacturing the semiconductor device.
[0002] This application is based on Patent Application Hei 10-272788, Patent Application Hei 11-67744 and Patent Application Hei 11-133283 filed in Japan, the contents of which are incorporated herein. Background technique
[0003] Usual non-destructive inspection techniques are known from papers such as the title "Thermal Electromotive Force-Based OBIC Analysis Technique", which was presented as material for the 132 meeting of the Japan Research Institute Promotion Fund 132 Committee on Research Aspects, Involving Charged Particles industrial applications. Here, "OBIC" is an abbreviat...