Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multilayer structure bonded seal protective capacity pressure sensor and producing method

A pressure sensor and multi-layer structure technology, which is applied in the direction of fluid pressure measurement using capacitance changes, etc., can solve the problems of poor anti-interference ability of the sensor, large temperature influence, unsatisfactory effect, etc., and achieve stable working characteristics and ideal zero pressure characteristics , good effect of overload protection

Inactive Publication Date: 2005-03-02
XIAMEN UNIV
View PDF1 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The silicon piezoresistive pressure sensor has the characteristics of small size, simple structure and manufacturing process, and high sensing sensitivity. The disadvantage is that the sensor has poor anti-interference ability and large temperature influence.
Sealing the capacitive cavity of silicon-glass capacitive pressure sensors is a problem because it is difficult, if not impossible, to obtain a hermetic bonding material that bonds well to glass, silicon, and metal at the same time
In order to solve this problem, people choose various materials to seal the groove of the lead-out electrode, but the effect is not satisfactory.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multilayer structure bonded seal protective capacity pressure sensor and producing method
  • Multilayer structure bonded seal protective capacity pressure sensor and producing method
  • Multilayer structure bonded seal protective capacity pressure sensor and producing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The following embodiments will further illustrate the present invention in conjunction with the accompanying drawings.

[0042] As shown in Figures 1 to 5, the multi-layer structure bonded and sealed protective capacitive pressure sensor includes a main silicon chip 18 with a pressure-sensitive membrane 10, a glass substrate 19 provided with a capacitor cavity electrode 16, and a capacitive sensor for sealing the capacitor cavity. Seal glass 1 and protect silicon wafer 4. The square silicon diaphragm or the circular silicon diaphragm 11 is made of P-type doped silicon semiconductor material utilizing P + Etching technology or PN junction chemical etching technology to form membrane or SOI (silicon on insulator) silicon wafer production. Specifically, it can be described as follows, there is a layer of P on the lower surface of the main silicon chip 18. +The diaphragm 11 is formed by etching technology or PN junction chemical etching technology or SOI (silicon on insul...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Multi-structure linkage enclosed protecting capacitance pressure sensor and its manufacturing method relate to a pressure sensor, supplying sensor with good hermetical characteristic, stable performance, excellent bearing capacity, high linearity and sensibility, and technical method with good versatility and low manufacturing cost, having prime silicon slice, glass substrate, enclosed glass, silicon film electron and capacitance cavity electron. Wash, dry, oxidize the prime silicon slice, erode capacitance cavity, then spread to form P+layer or PN node of film, creating metal electron; isolation glass is made on metal electron, prime silicon slice and glass slice is linked; dual-plane polishing glass slice used for enclosing glass is linked with protecting silicon slice; enclosing glass is isolation wall has static electricity linkage with enclosing glass. Use linkage structure of two pieces of silicon and two pieces of glass, and multi-structure static electricity linkage technique enclosing capacitance cavity, to produce capacitance cavity type micro pressure sensor, avoiding effectively the problem of capacitance cavity enclosing linkage.

Description

technical field [0001] The invention relates to a pressure sensor, in particular to a multi-layer structure bonding and sealing protection capacitive pressure sensor. Background technique [0002] Due to the good mechanical properties of silicon materials, with the maturity of semiconductor technology, there are means to make sensors with silicon materials. First, the silicon piezoresistive pressure sensor was researched and manufactured. The silicon piezoresistive pressure sensor has the characteristics of small size, simple structure and manufacturing process, and high sensing sensitivity. The disadvantage is that the sensor has poor anti-interference ability and large temperature influence. Capacitive pressure sensors made of silicon and glass bonding have the characteristics of small size, structure, simple manufacturing process, and high sensing sensitivity compared with silicon piezoresistive pressure sensors, and also have good structural stability, high strength, an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01L9/12
Inventor 冯勇建
Owner XIAMEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products