Non-linear hot wire structure used for preparing large area uniform thin film

A large-area, hot-wire technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of increasing the size of the reaction chamber, reducing the uniformity of the thermal field, and eliminating the size of the reaction chamber. , The realization method is simple and unique, and the installation is convenient.

Inactive Publication Date: 2005-04-06
GD SOLAR +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The uniformity of the thermal field distribution of the substrate in the vertical heating wire length direction (transverse direction) can be increased by changing the number of parallel heating wires and a reasonable arrangement interval; the uniformity of the thermal field distribution along the length direction (longitudinal) of the parallel heating wires, Due to the influence of the temperature drop at the end of the heating wire, the uniform length U of the longitudinal thermal field l Only about 60% of the length of the hot wire, the method of increasing the length of the hot wire is usually used to increase U l , but the too long heating wire is easy to bend due to thermal expansion after being heated, reducing the uniformity of the thermal field and reducing the uniform area S of the thermal field 0 Ratio to the area S of the hot wire structure F=U s / S, and increasing the length of the filament requires increasing the size of the reaction chamber, which is disadvantageous

Method used

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  • Non-linear hot wire structure used for preparing large area uniform thin film
  • Non-linear hot wire structure used for preparing large area uniform thin film
  • Non-linear hot wire structure used for preparing large area uniform thin film

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Embodiment Construction

[0023] The hot wire structure designed by the present invention for preparing a large-area uniform film is described in detail as follows in conjunction with embodiments and accompanying drawings:

[0024] The heating wire structure of the present embodiment is made up of four heating wires, as image 3 shown. It includes a heating wire rack 1, 4 heating wires 2 and a heating wire insulation joint 3. The heating wires are connected in series through insulating joints, the heating wires are evenly arranged in the horizontal direction, and the heating wires are wound into a spring shape, with different densities (turns / cm) at different positions, so as to achieve the effect of longitudinal nonlinearity on the resistance and temperature in the equivalent circuit. Require.

[0025] The specific parameters of this embodiment are: under the premise of uniform air intake, the area of ​​the hot wire rack is 16×16cm 2 , using linear and nonlinear hot wire structures to deposit micro...

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Abstract

The invention involves a kind to use in to prepare the big area even thin film the hot filament structure, belongs to the material preparation area of technology. The structure including hot filament frame, multi- roots hot filament and hot filament insulated rail joint; The hot filament insulated rail joint fixes on a hot filament two relative frame, this hot filament two reasons and the hot filament insulated rail joint are connected; Its characteristic lies in, various hot filament uses the non-uniform spring shape the hot filament, turn /cm is bigger than the hot filament intermediate region in the hot filament beginnings and ends region turn /cm. The invention involves the hot filament structure, through enhanced the vertex hot filament temperature to solve well has limited the big area application the kernel Si boundary cold end effect, enhanced the hot filament longitudinal of hot field uniformity, avoided the dependence increase hot filament length enhancing the hot filament which the hot filament direction uniformity caused to be curving and the cavity body oversized question, obviously increased ratio of F the even hot field area and hot filament structure area, effectively realized the big area even thin film deposition, had simply, the practical convenience characteristic.

Description

technical field [0001] The invention belongs to the technical field of material preparation, and in particular relates to a structural design of a hot wire in a thermal catalyst for preparing a large-area uniform thin film. Background technique [0002] Thermal catalytic chemical vapor deposition is a commonly used thin film preparation method. In the industrial production, the large-area uniformity of the thin film is one of the key technologies. The large-area uniformity of thin films prepared by thermal catalytic chemical vapor deposition technology is mainly affected by the structure of the hot wire in the intake system and thermal catalytic converter. Usually a parallel linear hot wire structure is used, such as figure 1 As shown, a plurality of linear metal heating wires 2 are arranged in parallel, and their two ends are fixed on a heating wire frame 1 through insulating joints 3 . In the figure, 4 heating wires are taken as an example, tungsten wire is used as the r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/46C23C16/48
Inventor 朱美芳谷锦华刘丰珍
Owner GD SOLAR
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