Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Production process of transparent conductive low-radiation glass coating

A low-emissivity glass, transparent and conductive technology, which is applied in the production field of transparent and conductive low-emissivity glass coatings, can solve the problems of difficult control, difficult to effectively treat hydrogen chloride gas, and high processing costs, and achieve the effect of increasing the solubility range

Inactive Publication Date: 2005-04-27
烟台佳隆纳米产业有限公司
View PDF4 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Off-line vacuum magnetron sputtering uses expensive solid targets and large-scale vacuum sputtering equipment, while on-line CVD uses gaseous metal-organic compounds, which are not only expensive, but also require undecomposed raw materials and The by-products after its decomposition are processed, and the processing cost is very high
The traditional tin tetrachloride solution spraying method instantaneously decomposes and reacts at high temperature, which is difficult to control, and it is difficult to effectively deal with the large amount of hydrogen chloride gas produced continuously

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] Example 1, a method for producing a transparent conductive low-E glass coating, is to first coat a silica intermediate layer on the surface of the float glass, and then use a precursor solution to spray a tin oxide low-e glass coating on the silica layer. Finally, the low-emissivity coating is coated with a silica outer coating. The precursor solution is synthesized by selective wet chemical reaction with tin inorganic compounds. The synthesized precursor solution is separated and purified, and the synthesized precursor solution is separated and purified. The reaction is carried out in an alcohol solvent. The alcohol solvent is a monohydric alcohol, a polyhydric alcohol or a mixed solvent of the two with a carbon content of 1-6. The inorganic compound of tin is tin dichloride or tin tetrachloride, which is selected in this example Monohydric alcohol is used as the solvent, the inorganic tin compound is tin dichloride, and the concentration of the tin inorganic compound is 0...

Embodiment 2

[0072] Example 2, a method for producing a transparent conductive low-E glass coating, is to first coat a silica intermediate layer on the surface of the float glass, and then use a precursor solution to spray a tin oxide low-e glass coating on the silica layer. Finally, the low-emissivity coating is coated with a silica outer coating. The precursor solution is synthesized by selective wet chemical reaction with tin inorganic compounds. The synthesized precursor solution is separated and purified, and the synthesized precursor solution is separated and purified. The reaction is carried out in an alcohol solvent. The alcohol solvent is a monohydric alcohol, a polyhydric alcohol or a mixed solvent of the two with a carbon content of 1-6. The inorganic compound of tin is tin dichloride or tin tetrachloride, which is selected in this example The mixture of monohydric alcohol and polyhydric alcohol is used as the solvent, the inorganic compound of tin is tin tetrachloride, and the conc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention discloses the production process of transparent conductive low-radiation glass coating. The inorganic compound of tin is used as material in synthesizing one kind of precursor solution for producing transparent conductive low-radiation glass coating on the surface of float glass; and the precursor solution is sprayed to the surface of hot float glass to form doped low-radiation tin oxide layer with required thickness and performance. The present invention has the features of low material cost, high chemical stability at normal temperature, high decomposition efficiency at high temperature, less pollution, simple production process and being suitable for on-line and of-line producing transparent conductive low-radiation glass coating.

Description

1. Technical Field [0001] The invention belongs to the technical field of forming a transparent conductive low-e glass coating on the surface of float glass, and in particular relates to a precursor solution of using an inorganic compound of tin to synthesize tin through selective chemical reaction as a coating material. A production method for depositing a transparent conductive low-radiation doped tin oxide coating on the glass surface. 2. Background technology [0002] Low-emissivity glass coating is to apply one or more layers of specific metal, metal oxide or nitride or a combination of coatings on the glass surface by physical or chemical methods, under the premise that the visible light transmittance is as high as possible It is a kind of glass functional coating that prevents the transfer of mid- and far-infrared thermal radiation energy, so as to achieve the effect of energy saving and heat preservation. It is called low-emissivity glass coating because of its low emissi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C4/14C03C17/23C03C17/34
Inventor 卢金山盛振宏
Owner 烟台佳隆纳米产业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products