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Projection light etching image-forming system

A polarization imaging and projection optics technology, applied in optics, optical elements, polarization elements, etc., can solve the problem of large influence of lithography patterns, and achieve the effect of improving resolution, improving resolution, and improving imaging focal depth.

Inactive Publication Date: 2011-06-15
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Deficiencies of the existing projection optics lithography imaging system: With the increase of numerical aperture (NA) and the shortening of wavelength, the vector diffraction effect based on polarization characteristics has an increasing influence on lithography graphics, and fine line graphics cannot be performed. make

Method used

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  • Projection light etching image-forming system
  • Projection light etching image-forming system
  • Projection light etching image-forming system

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Embodiment Construction

[0021] Such as figure 1 As shown, the present invention consists of an ellipsoidal mirror 1, a light source 2, a high-energy and high-uniform illumination component 3, a polarization mask 4, a projection lithography objective lens 5, and a silicon wafer 6. The light emitted by the light source 2 is captured by the ellipsoidal mirror 1 collects and gathers the light through the high-energy and high-uniform illumination component 3 to illuminate the polarization mask 4, and the ultra-fine feature pattern on the polarization mask 4 is projected and imaged on the silicon wafer 6 through the projection lithography objective lens 5, wherein the polarization mask 4 is composed of a quartz substrate 9 and a polarizing film layer 7 and a polarizing film layer 8 fabricated on it that can perform different linear polarization modulations on the imaging beam, the linearly polarized light modulated by the polarizing film layer 7 and the polarized film layer 8 modulated Linearly polarized l...

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Abstract

The projection photoetching polarization imaging system includes ellipsoidal lens, light source, high strength and has homogeneity lighting part, projection photoetching objective, silicon chip, etc. and features the polarizing mask set in the object plane of projection photoetching objective for polarizing modulation of the imaging light beam, and the imaging light beams transmitting the polarizing mask and with modifying polarization states and vertical electric field vibration directions in 45 deg to the edge of characteristic photoetching line. The light beams with vertical polarization directions produce no interference and results in no secondary peak of images of adjacent line on the silicon chip, less proximity effect and raised resolution. Thus, the present invention can result in raised photoetching imaging resolution and increased focal depth of projection photoetching and imaging system.

Description

Technical field [0001] The invention relates to a projection optical lithography polarization imaging system in the technical field of step-and-repeat projection lithography machine and step-scan projection lithography machine high-resolution projection imaging technology for ultra-large-scale integrated circuit production equipment. Background technique [0002] The urgent demand for VLSI devices has promoted the rapid development of projection optical lithography technology. In order to extend the limit and life of projection optical lithography technology, in recent years, short wavelength, large numerical aperture, and off-axis illumination technology are often used etc. However, as the numerical aperture increases and the exposure wavelength shortens, the polarization-based vector diffraction effect has an increasing influence on the lithographic pattern, such as the minimum feature size of lithography is close to and lower than the exposure wavelength; the high numeric...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/28G02B5/30H01L21/027G03F7/20
Inventor 余国彬姚汉民胡松刘业异
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI