Long life ionic source of ion injection machine

Abstract

This invention relates to a long life ionic source of ion injection machine used in ion injection technology for manufacturing semiconductors including: an ionic source shell, two supporting plates, two end plates, a reflection pole connection bar, a reflecting pole, a lead out plate, an indirectly heated cathode, a screen tube, a heating electronic gun, a heat screen plate, two filament fixing rods, a source magnetic field excitation wire packet, an insulation material block and an induction pipe. Advantages: 3-4times of the lifetime of the ordinary ionic source, stable and full discharge.

Description

technical field [0001] The invention relates to a long-life ion source for an ion implanter, in particular to the long-life ion source for an ion implanter used in the ion implantation process of semiconductor manufacturing. Background technique [0002] In recent years, with the development of semiconductor integrated circuit technology and chip technology, in semiconductor integrated circuit manufacturing technology, the integration level is getting higher and higher, the circuit scale is getting bigger and bigger, and the unit device size in the circuit is getting smaller and smaller. Equipment puts forward higher requirements. As one of the key equipment of the semiconductor ion doping process line, the ion implanter also puts forward high requirements on it. The ion implanter is required to have: good reliability of the whole machine, high production efficiency, and wide energy range of various charged ions Injection, precise control of beam injection energy accuracy, ...

AI Technical Summary

Problems solved by technology

[0004] The present invention aims at the shortcoming of the short service life of the ion source of the ion implanter in the prior art, and proposes a long-life ion source of the ion implanter

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