Vertical bipolar transistor and method of manufacturing the same
A gate, conductive type technology, applied in the field of vertical bipolar transistors and their manufacturing, can solve the problems of reducing the current amplification rate, increasing the impurity concentration of the well region, increasing the well concentration, etc., to achieve the effect of improving performance
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[0056] Below, refer to Figure 1-Figure 7 , the structure of the vertical NPN bipolar transistor and the manufacturing method of the MOS transistor in the CMOS part are explained together.
[0057] like figure 1 As shown, in order to divide each region of the CMOS part and the bipolar part on the P-type silicon substrate 10, the separation region 11 is selectively formed by using STI. Then, the deep N-type well region 12 working as the collector region of the bipolar transistor, the P-type well region 13 working as the base region, and the lead-out region of the aforementioned collector region are selectively formed by ion implantation. N-type well region 14 . As described later, an N-channel MOSFET is formed in the P-type well region 13 of the CMOS portion, and a P-channel MOSFET is formed in the N-type well region 14 .
[0058] like figure 2 As shown, the gate structure Gs is formed using the gate formation process of the CMOS part. Simultaneously with this gate forma...
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