Self-calibrating method and apparatus for ultra precise workbench

A workbench and self-calibration technology, applied to measuring devices, complex mathematical operations, instruments, etc., can solve the problems of difficult calibration of three-dimensional ultra-precision workbench, poor scalability, limited application, etc., so as to avoid modeling errors and use flexibly , low-cost effect
CN1667359AActive Publication Date: 2005-09-14TSINGHUA UNIV +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TSINGHUA UNIV
Publication Date
2005-09-14

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Abstract

The invention discloses an automatic calibration method and apparatus applied to three-dimensional ultra-sophisticated bench. The method is to set an automatic calibration model containing error message of grid glass sheets and calibrated bench through the medium of chromed grid glass sheets, and processes measured data of grid pip in different testing position to eliminate effects of position error of grid glass sheet grid pip. The invention also discloses an automatic calibration apparatus, comprising chromed grid glass sheets with grid pulser matrix, a positioning devise with optical components and XY plane position sensor, an image-gathering card and a computer storing related program.
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Description

technical field

[0001] The invention relates to an ultra-precision workbench, in particular to a self-calibration method and device for an ultra-precision workbench for integrated circuit processing and testing equipment, belonging to the field of ultra-precision processing and measurement. Background technique

[0002] Ultra-precision worktables are widely used in integrated circuit processing and testing equipment, and play an extremely important role. For example, as the core component of the lithography machine, the ultra-precision workpiece stage (the mask stage and the silicon wafer stage of the lithography machine) carries the silicon wafer or the mask and moves according to the set speed and direction, and passes through the mask stage and the silicon wafer. The high-precision positioning and synchronization of the table realize the precise transfer of the mask image features to the silicon wafer. Therefore, the movement and positioning accuracy of the ultra-precisio...

Claims

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