Packaging method for semiconductor image sensing module
A technology of image sensing and packaging method, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of poor heat dissipation, large size, poor thermal conductivity of plastics, etc. volume effect
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[0046] see figure 1 and FIG. 4, the packaging method of the semiconductor image sensing component of the present embodiment,
[0047] It includes the following steps:
[0048] a. Preparation:
[0049] A single crystal silicon chip is selected as the process substrate 1 .
[0050] b. Form a protective layer:
[0051] The substrate 1 is placed in a furnace tube, and a layer of silicon dioxide is grown on both sides of the substrate 1 by thermal oxidation or a layer of silicon nitride is grown by deposition as a protection layer 11 , 12 .
[0052] c. Define the etching hole:
[0053] Part of the protective layer is removed on both sides of the substrate 1 by BOE wet etching or RIE dry etching by lithography process, so that the surface area of the substrate 1 to be etched subsequently is exposed.
[0054] d. Etching:
[0055] Utilize the KOH or TMAH anisotropic wet etching method to etch the parts without the protective layers 11 and 12 on both sides of the substrate 1, ...
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