Hard alloy punch head surface treatment method by ion beam assisted deposition
A punch and technology, which is applied in the field of ion-assisted vapor deposition technology to improve surface hardness, can solve problems such as high cost and low life, and achieve the effects of improving surface characteristics, low cost and high production efficiency
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[0010] figure 1 It shows the implementation schematic of coating WCC on the surface of ASP-23 punch by this process method. Put the ASP-23 punch connected to the positive high voltage into the plasma-assisted vapor deposition furnace, the furnace temperature is 500°C-560°C, the preferred value is 560°C, the pressure in the furnace is 80Pa-100Pa, the preferred value is 100Pa, and the reaction gases WF6 and CH4 are introduced , apply a DC voltage, when the voltage reaches above 20KV, CH4 is first ionized [C], and forms a layer of negative ion shoes on the surface of the punch, under the action of the electric field force, it is injected into the surface of the punch vertically at a relatively high speed up to 1 μm, then increase the voltage, WF6 is also ionized, when [w] and [C] reach a certain concentration, quickly reduce the voltage, [w] and [C] react to generate WC, and deposit on the surface of the punch, and The [C] ions entering earlier form WCC. It makes the lattice of...
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