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Laser direct writing anti-counterfeit label

An anti-counterfeiting mark and laser direct writing technology, applied in the field of anti-counterfeiting marks, can solve problems such as loss of anti-counterfeiting characteristics, and achieve the effect of increasing anti-counterfeiting reliability, ensuring anti-counterfeiting reliability and important application prospects.

Inactive Publication Date: 2010-05-05
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Laser holographic anti-counterfeiting marks are high-tech products, but because they have been used for many years, their anti-counterfeiting methods have been widely mastered by technical personnel in the field, and many manufacturers have emerged, so they have gradually lost their reliable anti-counterfeiting characteristics.

Method used

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  • Laser direct writing anti-counterfeit label
  • Laser direct writing anti-counterfeit label
  • Laser direct writing anti-counterfeit label

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Embodiment 1: Micro grating structure pattern and text anti-counterfeiting mark

[0018] A micro-grid structure arranged with micron-scale or thinner lines forms a macroscopic pattern and text strokes with a rainbow effect. In the same logo pattern, the period and direction of the grating stripes of each local pattern or character stroke can be selected arbitrarily, and the period encryption and direction encryption of the grating stripes can be performed.

[0019] In this embodiment, words such as "ZKYGDS Institute of Optoelectronic Technology, Chinese Academy of Sciences" are first drawn with a computer, and they are arranged in a circular shape, and a five-pointed star is drawn in the center of the circle. , the grating lines are also formed with a pitch of 1.5 μm and are inclined at 30°. Here, the width and inclination angle of the grating lines constituting the characters and patterns can be selected arbitrarily for encryption. Then, copy the graphic files drawn ...

Embodiment 2

[0020] Embodiment 2: Anti-counterfeiting mark of microtext

[0021] The character height of the Chinese microtext produced by the present invention can be as small as 20 microns, and the character height of English letters and Arabic numerals can be as small as 10 microns, which cannot be achieved by other printing technologies.

[0022] In this embodiment, at first, the computer is used to draw the characters such as "Institute of Optoelectronic Technology, Chinese Academy of Sciences" with a character height of 16 microns and the characters "GDShds507" with a character height of 8 microns, and then the graphic files drawn by the computer Copy it into the laser direct writing system, use the special process of the laser direct writing system to make a photolithography mask to expose the photoresist film layer on the substrate, and transfer the designed microtext graphics to the photoresist precisely , and then develop the exposed photoresist film layer on the substrate with a...

Embodiment 3

[0023] Embodiment 3: Anti-counterfeiting mark of filling pattern

[0024] Fill large patterns or text strokes with encoded numbers, encrypted ASCII characters, special patterns, etc. Numbers, characters, content, size and direction of special patterns used for filling can be used for encryption.

[0025] In this embodiment, a computer is first used to draw a Chinese character "electricity" with a character height of 2 mm and a Chinese character "Suo" with a character height of 1.2 mm. Here, the character height size of the text can also be used for encryption. Each stroke of the character "electricity" is filled with the character string "2004" with a character height of 12 microns at an angle of 45°. 300° filling composition. Here, the content, size, inclination angle, etc. of the padding string can be used for encryption. Then, the filling pattern file drawn by the computer is copied into the laser direct writing system, and the photoresist film layer on the substrate is...

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PUM

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Abstract

The invention relates to a method for producing the photo-etched mask plate of micro-photo-etched technique, which is used in laser direct-writing false proof mark. The invention first uses the computer to draw the pattern of false proof mark; uses the laser direct-writing system to transfer said pattern on the film of photo-resist on the basic plate to form the relief master mask; uses the mastermask and the subsequent processes as electro-plate, die stamping cop and contour machining to attain the final false proof mask. The invention has high advanced technique, high cost, complex processes, high accurate produced pattern and the realization of false proof property. In addition, the invention uses the computer to draw pattern which can design and encode the details of pattern and wordto confirm the false proof.

Description

technical field [0001] The invention relates to an anti-counterfeit mark produced by a method for producing a photolithographic mask plate by adopting laser direct writing technology. Background technique [0002] There are many types of anti-counterfeiting marks, and the widely used anti-counterfeiting marks are laser holographic anti-counterfeiting marks. In the book "Anti-counterfeiting Printing" (edited by Zhang Yixin, etc., China Light Industry Press, first edition in May, 1999), the production principle and process of laser holographic anti-counterfeiting marks are introduced in detail. Laser holographic anti-counterfeiting marks are high-tech products, but because they have been used for many years, their anti-counterfeiting methods have been widely mastered by technical personnel in the field, and many manufacturers have emerged, so they have gradually lost their reliable anti-counterfeiting characteristics. Contents of the invention [0003] The technical problem...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G06K1/12B44F1/12B42D25/324
Inventor 侯德胜
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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