Eavcuation valve control device

Abstract

The present invention includes side valve, isolation valve, valve control unit, vacuum pump, cavity, and vacuum switch. Said invention can effectively control particulate pollution in reaction cavity vacuum-pumping process, even in unit platform state such as cavity state pumping speed varying.

Description

technical field [0001] The invention relates to a control device for a vacuum valve in semiconductor manufacturing, in particular to a control device for controlling the vacuum valve by using the pressure state of a chamber. Background technique [0002] The semiconductor manufacturing industry has extremely strict requirements on particle size. Every process must consider how to minimize the generation of particles, so as to improve the yield of production. When the etching machine is working, some by-products will be produced in the reaction chamber due to the bombardment and reaction of the plasma on the silicon wafer. Most of these by-products will be sucked away by the vacuum pump, and a small part will form polymers and adhere to the reaction chamber. interior wall. When evacuating the reaction chamber, if the pumping speed is high, turbulent flow will be generated in the reaction chamber, which will cause the polymer particles attached to the inner wall of the reacti...

AI Technical Summary

Problems solved by technology

If the action of the valve is still performed according to the initially set time, then the valve with a high pumping speed (isolation valve 2) will be opened when the pressure is high, and the air flow at this time will cause the particles on the inner wall of the reaction chamber to fall off. In this state, the current technical solutions cannot fully realize the effect of reducing particle generation

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