Array substrate for display device

An array substrate and substrate technology, which is applied in the field of display devices, can solve the problems of increasing capacitance, changing pixel voltage and brightness, etc., and achieves the effects of eliminating etching and reducing contact resistance.

Inactive Publication Date: 2007-01-24
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the capacitance of the insulating layer formed on the second layer increases, thereby changing the pixel voltage and its brightness

Method used

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  • Array substrate for display device
  • Array substrate for display device
  • Array substrate for display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Figures 4A to 4H Formed for illustration as figure 2 Cross-sectional views of each step of the array substrate shown, Figure 5 Formed for illustration as Figure 4B Cross-sectional view of the reactive sputtering setup for the third metal layer shown, Figure 6 Formed for illustration as Figure 4B A cross-sectional view of the PCVD device for the third metal layer is shown. refer to Figure 4A , the first metal layer 500 is formed on the first insulating substrate 210 . The first metal layer 500 may be formed using aluminum neodymium. In one embodiment of the present invention, the first metal layer 500 is formed by a sputtering process or a chemical vapor deposition (CVD) process using AlNd as a target material. The first metal layer 500 is formed in the entire display area DA, the first peripheral area PA1 and the second peripheral area PA2 on the first insulating substrate 210 .

[0037] refer to Figure 4B , the second metal layer 510 is formed on the f...

Embodiment 2

[0060] Figures 7A to 7G Formed for illustration as figure 1 Cross-sectional views of each step of the array substrate shown, Figure 8 To illustrate etch as Figure 7C A cross-sectional view of the etch bath for the first, second and third metal layers is shown.

[0061] refer to Figure 7A , the first metal layer 500 is formed on the first insulating substrate 210 . The first metal layer 500 may be formed using aluminum neodymium. In one embodiment of the present invention, the first metal layer 500 is formed by a sputtering process using AlNd as a target material and a chemical vapor deposition (CVD) process.

[0062] The second metal layer 510 is formed on the first insulating substrate 210 on which the first metal layer 500 is formed. The second metal layer 510 may be formed using chrome. In one embodiment of the present invention, the second metal layer 510 is formed by a sputtering process using chromium as a target material. The third metal layer 520 is formed ...

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Abstract

A substrate for an LCD display device exhibiting improved display quality through lower contact resistance and elimination of undercutting. The display switches have three electrodes, at least one of which has three metal layers, the third of which is formed by nitrating the second metal layer. The pixel electrode is electrically connected to the second metal layer through a contact hole formed through an insulation layer and the second metal layer of the switching device.

Description

technical field [0001] The invention relates to an array substrate, a method for manufacturing the array substrate and a display device with the array substrate. More particularly, the present invention relates to an array substrate with improved display quality, a method of manufacturing the array substrate with improved display quality, and a display device with the array substrate with improved display quality. Background technique [0002] Generally, a liquid crystal display (LCD) device includes an array substrate, a color filter substrate opposite to the array substrate, and a liquid crystal layer interposed between the array substrate and the color filter substrate. The array substrate has a plurality of pixels, and each pixel includes: a gate line providing a gate signal, a data line providing a data signal, a thin-film transistor (TFT) electrically connected to the gate line and the data line, and receiving a data signal and applying it to the liquid crystal layer. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L29/786H01L29/49H01L23/522H01L21/84H01L21/336H01L21/28H01L21/768
Inventor 李仁成赵能镐李东勋崔渊琇崔浩根崔填喆
Owner SAMSUNG DISPLAY CO LTD
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