Vertical heat treatment apparatus and method for operating same

一种热处理装置、热处理炉的技术,应用在薄料处理、运输和包装、电气元件等方向,能够解决空间增大占用面积、限制可保管载体数量等问题,达到实现产量、产量提高、实现保管数量的效果

Active Publication Date: 2007-01-31
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the conventional vertical heat treatment apparatus, only storage racks are provided as space for storing carriers, so the number of carriers that can be stored is limited.
Moreover, the loading table also only has the function of loading the carrier into the vertical heat treatment device and taking it out from the vertical heat treatment device
In addition, it is not preferable to increase the vertical heat treatment device in order to expand the space for storing the carrier, that is, to increase the occupied area (occupied planar area) (footprint).

Method used

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  • Vertical heat treatment apparatus and method for operating same
  • Vertical heat treatment apparatus and method for operating same
  • Vertical heat treatment apparatus and method for operating same

Examples

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Embodiment Construction

[0037] Hereinafter, best embodiments of the present invention will be described in detail with reference to the accompanying drawings. figure 1 It is a vertical cross-sectional view schematically showing a vertical heat treatment apparatus according to an embodiment of the present invention. figure 2 to represent figure 1 The perspective view of the schematic structure of the vertical heat treatment device shown in . image 3 It is an explanatory diagram showing how to use the vertical heat treatment apparatus.

[0038] In these figures, reference numeral 1 represents a vertical heat treatment apparatus, and this heat treatment apparatus 1 includes: a carrier (transport container) 2 for accommodating a plurality of pieces (for example, 25 pieces) of objects to be processed (for example, semiconductor wafers), through which Loading tables (carry-in and unloading parts) 3 and 4 that are carried into and out of the heat treatment device 1; as a first storage part that accommod...

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Abstract

A vertical heat treatment apparatus is provided with at least one of carrying in / out parts (3, 4) for carrying in and out a transporting container (2) storing a plurality of sheets of works (W) to be treated to and from the vertical heat treatment apparatus; a first storing part (5) for storing a plurality of transporting containers carried into the vertical heat treatment apparatus through the carrying in / out part; a heat treatment furnace (7) for performing prescribed heat treatment to the works by storing a holding tool (6) holding a multitude of sheets of works at a multitude of levels; and a transfer part (8) for placing the transporting container to transfer the works between the holding tool and the transporting container. The vertical heat treatment apparatus is provided with an upper level carrying in / out part (3) and a lower level carrying in / out part (4) as the carrying in / out part; and a second storing part (20) for storing the transporting container between the upper level and the lower level carrying in / out parts. One of the carrying in / out parts (3, 4) is permitted to be a third storing part (30) for storing the transporting container (2). The number of transporting containers to be stored can be increased without increasing the footprint, and a throughput can be improved.

Description

technical field [0001] The invention relates to a vertical heat treatment device and a using method thereof. Background technique [0002] In the manufacture of semiconductor devices, various processing apparatuses (semiconductor manufacturing apparatuses) are used to perform treatments such as oxidation, diffusion, chemical vapor deposition (CVD: Chemical Vapor Deposition), and annealing on an object to be processed (for example, a wafer). As one of them, there is known a vertical heat treatment apparatus of a batch processing type that can heat process a plurality of wafers at one time. [0003] The vertical heat treatment device includes: it is arranged on the front part of the vertical heat treatment device, and a carrier (called a transfer container, FOUP) containing a plurality of wafers is carried into the vertical heat treatment device through it and carried out from the vertical heat treatment device. A load port (load port) (loading and unloading part) that is car...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677
CPCH01L21/67109H01L21/67769Y10S414/14H01L21/324
Inventor 原木健次郎山本博之植村聪角田勇二竹内靖酒井裕史
Owner TOKYO ELECTRON LTD
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