Method for producing microphone unit, thermal-oxidative layer and low-stress structural layer

A technology of thermal oxidation layer and structural layer, which is applied in the direction of manufacturing microstructure devices, microstructure technology, microstructure devices, etc.

Inactive Publication Date: 2010-08-25
TOUCH MICRO SYST TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] An object of the present invention is to provide a method for making a miniature microphone device, so as to solve the insurmountable problems of the prior art
[0009] Yet another object of the present invention is to provide a method for making a low-stress structural layer to solve the insurmountable problems of the prior art

Method used

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  • Method for producing microphone unit, thermal-oxidative layer and low-stress structural layer
  • Method for producing microphone unit, thermal-oxidative layer and low-stress structural layer
  • Method for producing microphone unit, thermal-oxidative layer and low-stress structural layer

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Embodiment Construction

[0024] Please refer to Figure 7 to Figure 15. 7 to 15 are schematic diagrams of a method for making a miniature microphone device according to a preferred embodiment of the present invention, wherein for enlarging the features of the present invention, only a single miniature microphone device is shown in the figure, and the method for making a miniature microphone device in the present invention It can be divided into three main stages, wherein the first stage is the step of making the thermal oxidation layer (as shown in Figures 7 to 9), the second stage is the step of making the structural layer (as shown in Figures 10 to 13), The third stage is the step of making the cavity (as shown in FIGS. 14 to 15 ). As shown in FIG. 7 , first provide a substrate 50, such as a silicon substrate or a silicon-covered insulating substrate, and then use a deep etching technique, such as an inductively coupled plasma deep etching technique, an X-ray deep etching technique or an electron cyc...

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Abstract

The method comprises: providing a substrate; forming multi trenches on the frond face of the substrate; forming a thermal oxidation layer on the inner wall and the front face of the substrate, and filling up the trenches; forming a first structure layer on the thermal oxidation layer, and doping in the first structure layer; forming a second structure layer on the first structure layer on the second structure and making annealing practice in order to reduce the stress between the first structure layer and the second structure layer; defining the pattern of first structure layer and the secondstructure layer in order to form multi membranes; fixing the second structure layer in the bear substrate, and forming multi cavities corresponding to the membranes on the back face of the substrate by using deep etching technology.

Description

technical field [0001] The invention relates to a method for manufacturing a miniature microphone device, and more specifically relates to a method for shortening the process time of a thermal oxidation layer and reducing the stress of a structural layer. Background technique [0002] Due to the advantages of small size and good reliability, the miniature microphone device made by micro-electromechanical technology has gradually replaced the traditional microphone device and become the mainstream of the market. Among them, the capacitive miniature microphone device has high sensitivity, low self-noise and Low distortion (distortion) and other characteristics, is currently the most widely used miniature microphone device. [0003] Please refer to Figure 1 to Figure 6. 1 to 6 are schematic diagrams of a method for manufacturing a capacitive micro-microphone device according to the prior art, wherein for convenience of description, only a single capacitive micro-microphone dev...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H04R31/00B81C1/00H01L21/00
Inventor 林弘毅周尧天刘娉婷
Owner TOUCH MICRO SYST TECH
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