Method of forming a micro-aperture, projection having a micro-aperture, probe or multi-probe having such a projection and surface scanner, aligner or information processor comprising such a probe
a technology of micro-apertures and projections, applied in the field of micro-apertures, can solve the problems of poor productivity of micro-apertures in any of the known techniques, difficulty in realizing a process that can produce a number of micro-apertures in an integrated manner, and known techniques accompanied by difficulty in precisely controlling the diameter of micro-apertures
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
example 1
[0047] Example 1 relates to an array of 100 micro-apertures arranged in the form of a 10.times.10 matrix on a silicon substrate (see FIG. 3A) and a method of forming the array. An array of micro-apertures as prepared in Example 1 may typically be used to expose a sheet of photoresist to light to produce a micro-pattern by irradiating light from the side opposite to the side where the micro-apertures are arranged, while holding the photoresist so close to the micro-apertures as to make it exposed to evanescent light coming from the micro-apertures.
[0048] FIGS. 2A through 2H are schematic cross sectional views of an array of micro-apertures prepared in Example 1, showing different preparation steps as is will be described hereinafter.
[0049] A thermally oxidized silicon oxide film was formed to a thickness of 100 nm as protective layer 2 on a single crystal silicon wafer substrate 1 having a crystal plane of (100). Then, the protective layer 2 was patterned to expose the silicon by 50 ...
example 2
[0059] This example relates to an optical probe formed on a substrate comprising a projection having a micro-aperture at the tip thereof.
[0060] A probe as prepared in Example 2 may typically be used to change the state of the surface of a micro-area of photoresist 20 by introducing light from the back side of the probe and irradiating the micro-area with evanescent light through the micro-aperture of the probe (see FIG. 5A).
[0061] It may also be combined with a light receiving device 22 and used in a microscope for detecting light in a near field (see FIG. 5B).
[0062] FIGS. 4A through 4F are schematic cross sectional views of an optical probe having a micro-aperture prepared in Example 2, showing different preparation steps. Now, the process of forming an optical probe having a micro-aperture will be described by referring to FIGS. 4A through 4F.
[0063] A thermally oxidized silicon oxide film was formed to a thickness of 100 nm as protective layer on a single crystal silicon wafer fir...
example 3
[0073] Example 3 relates to an optical multi-probe having an array of 100 optical probes, each having a projection and a micro-aperture at the top of the projection, arranged in the form of a 10.times.10 matrix on a substrate (see FIG. 7).
[0074] Each of the optical probes is provided with a light emitting device that is a surface emitting laser and wiring electrodes for driving it. An optical multi-probe as prepared in Example 3 may typically be used to change the state of the surface of a micro-area of photoresist by irradiating it with near-field light from each of the probes.
[0075] The rate of forming micro-patterns can be improved by intra-planarly scanning photoresist, turning on and off each of the probes in a controlled manner. While each probe having a micro-aperture is combined with a light emitting device in the example, the multi-probe may be combined with light receiving devices such as avalanche photodiodes to produce a multi-light-receiving device unit.
[0076] FIGS. 6A ...
PUM
| Property | Measurement | Unit |
|---|---|---|
| temperature | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| depth | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More