Multi-layer wiring board and method of producing the same

Abstract

Disclosed is a multi-layer wiring board comprising insulating layers of a thermosetting resin having through-holes formed therein, conductor wiring layers buried in the surfaces of said insulating layers, and via-conductors formed by filling said through-holes with an electrically conducting paste, the via-conductors being electrically connected to said conductor wiring layers, wherein coupling layers comprising a silane coupling agent are formed in the interfaces between said conductor wiring layers and said via-conductors or said insulating layers. The multi-layer wiring board features an increased chemical affinity between the conductor wiring layer and the insulating layer, effectively suppressing the infiltration of water through the interface between the conductor wiring layer and the insulating layer or through the insulating resin, and effectively preventing deterioration in the properties under a high-temperature and high-humidity environment of an extended period of time.

Description

BACKGROUNG OF THE INVENTION[0001] 1. Field of the Invention[0002] The present invention relates to a multi-layer wiring board suited for a package for holding a semiconductor device and to a method of producing the same.[0003] 2. Description of the Related Art[0004] In recent years, electronic equipment have been produced in ever small sizes. Recent development of portable data terminals and widespread use of a so-called mobile computing operated while carrying a computer with the user, are further demanding a multi-layer wiring board fabricated in a further decreased size, in a more reduced thickness and having more highly dense wiring layers.[0005] There have further been widely used electronic equipment that must operate at high speeds as represented by communication equipment. The demand for a high-speed operation includes a variety of requests such as precise switching for the signals of high frequencies. To cope with such electronic equipment, it has been urged to provide a mu...

AI Technical Summary

Benefits of technology

[0027] In the multi-layer wiring board of the present invention, coupling layers comprising a silane coupling agent are present in the interfaces between the conductor wiring layers and the via-conductors or the insulating layers. The coupling layers work to markedly improve the adhesion or intimate contact between the conductor wiring layers and the via-conductors, or to markedly improve the adhesion or intimate contact between the conductor wiring layers and the insulating layers making, as a result, it possible to effectively prevent the infiltration of water and effectively avoiding the deterioration in the characteristics of when, for example, the conductor wiring layers and via-conductors are finely and densely formed.

[0029] The silane coupling agent forming the coupling layer is in itself an electrically insulating compound. It is therefore desired that the coupling layer formed in the interface between the conductor wiring layer and the via-conductors has a thickness in a range of from 10 to 100 nm. When the coupling layer is thickly formed, reliability in the electric connection may be spoiled between the conductor wiring layer and the via-conductors. Upon roughening the surface of the conductor wiring layer to lie within the above-mentioned range, further, the particles of silane coupling agent enter into the recessed portions in the surface of the conductor wiring layer, and a direct contact is maintained between the conductor wiring layer and the via-conductors effectively avoiding a decrease in the reliability of electric connection between them.

[0031] Since the conductor wiring layer is buried in the surface of the insulating layer, the multi-layer wiring board of the present invention exhibits excellent smoothness lending itself well for mounting flip chips and, besides, effectively prevents a decrease in the characteristics caused by the infiltration of water. Even when the pitch is decreased among the via-conductors, therefore, the insulation resistance does not decrease among the via-conductors. Even when the diameter of the via-conductors is decreased, the electric conductivity is not deteriorated, either. Therefore, the multi-layer wiring board of the present invention features a high reliability even when fine circuits are highly densely formed.

Problems solved by technology

According to the base+build-up method (1), however, the photosensitive epoxy resin used for forming the insulating layer has a low glass transition point and is sensitive to light involving such a defect that it absorbs water much.

That is, when left to stand under high-temperature and high-humidity conditions, the multi-layer wiring substrate obtained according to this method arouses a problem of decreased insulation.

However, the resin which absorbs water little has a low polarity and exhibits poor wettability to the surface of a metal which has a high polarity.

That is, with the multi-layer wiring board in which the insulating layer is formed of a resin that absorbs little water, the adhesion or intimate contact is not accomplished between the insulating layer and the conductor wiring layer, very easily permitting the passage of water that is a factor for deteriorating the characteristics of the wiring board.

When the diameter of the through-holes forming the via-conductors is decreased, further, a problem such as an increase in the resistance of the via-conductors appears conspicuously making it very difficult to fabricate a highly dense wiring board.

Such a multi-layer wiring board is not suited for the applications where flatness is required, such as mounting the silicon chips like flip chips.

However, the adhering force has not been improved yet between the core board and the insulating layer that is built up still leaving a problem concerning reliability.

That is, since the adhering force is poor on the interface between the insulating layer and the conductor wiring layer or the via-conductors, water which is a factor of deterioration easily infiltrates into the insulating resin layer.

Besides, water that has infiltrated into the insulating layer further infiltrates into the via-conductors arousing a problem of rise in the resistance of the via-conductors.

When the coupling layer is thickly formed, reliability in the electric connection may be spoiled between the conductor wiring layer and the via-conductors.

When the thermosetting resin has a large water-absorbing factor, the electric resistance of the via-conductors 3 may increase being affected by water absorbed by the thermosetting resin, and limitation is imposed on using the multi-layer wiring board in, for example, a high-temperature and high-humidity atmosphere.

When there is used a silane coupling agent having a boiling point of a low temperature, the heat resistance may become low.

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