Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Precision laser micromachining system for drilling holes

a laser micromachining and laser micromachining technology, applied in the direction of manufacturing tools, optical resonator shape and construction, welding/soldering/cutting articles, etc., can solve the problems of current laser micromachining methods, such as direct writing, and the inability to drill features with the sub-micron accuracy and precision needed for photonic crystals

Inactive Publication Date: 2005-05-19
LI MING +2
View PDF20 Cites 34 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

One reason that optical circuits have not been widely implemented is that there are manufacturing problems related to making photonic devices meet index of refraction specifications.
Current laser micromachining methods, such as direct writing, do not provide a way to drill features with the sub-micron accuracy and precision needed for photonic crystals.
The problem is that the holder cannot be moved with a level of accuracy suitable for manufacturing photonic crystals.
In addition to the spatial positioning errors, photonic structures may also suffer from blurring of the image of the laser beam as the feature sizes decrease to less than or equal to the size of the wavelength of the beam.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Precision laser micromachining system for drilling holes
  • Precision laser micromachining system for drilling holes
  • Precision laser micromachining system for drilling holes

Examples

Experimental program
Comparison scheme
Effect test

second embodiment

[0020]FIG. 2 is a block diagram of a drilling system 200. The system 100 includes a laser 105 which generates a laser beam 107 with a wavelength of 775 nm. In an alternative embodiment, the wavelength of laser beam 107 may be 387 nm. In such an alternative embodiment, the other characteristics of the system may be adjusted accordingly. Laser beam 107 travels along an optical path until it is incident upon first mirror 108. First mirror 108 is a conventional laser mirror having a high reflectivity at least at the wavelength of the laser beam 107. In this exemplary embodiment, first mirror 108 is highly reflective of 775 nm wavelength light. First mirror 108 redirects beam 107 along an optical path where it is incident upon shutter 110 which opens and closes to selectively illuminate work piece 155. Shutter 110 is a conventional laser shutter used to control the propagation of laser beam 107. In an exemplary embodiment, shutter 110 is an electric shutter controlled by a shutter contro...

first embodiment

[0032] The combination of lens 138 and lens 142 provides the same function in this embodiment as the “eyepiece” lens 138 and the microscope objective lens 142 in the In an exemplary embodiment, 100× lens 142 has a 2 mm focal length and a lcm working distance. The exemplary embodiment may use an Ultra Long Working Distance Lens (ULWD) having a working distance of lcm as the lens 142. Alternatively, a conventional 2 mm lens may be used along with an air knife to remove any material that is ablated from the work piece.

[0033] The combination of lens 138 (focal length f1=60 mm) and 100× lens 142 (focal length f2=2 mm) creates a de-magnification of thirty (f1 / f2) of sub-beam 137 upon work piece 155. Thus, the size of the image of the mask 135 on the work piece is {fraction (1 / 30)}th the size of the image at the mask 135. This de-magnification of thirty means a reduced-size image of sub-beam 137 is moved one-thirtieth of the distance that aperture 135 is moved. In one example, therefore, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Sizeaaaaaaaaaa
Wavelengthaaaaaaaaaa
Nonlinear systemaaaaaaaaaa
Login to View More

Abstract

A laser drilling system for drilling holes in a work piece with a laser. The system includes: a laser for creating a laser beam and directing the laser beam along an optical path; a mask having at least one aperture, the mask and the aperture being located in the optical path to cause the creation of a sub-beam; a lens for forming a reduced-size image of the sub-beam onto the work piece and a translation stage for moving the mask to change the position of the sub-beam on the work piece. The laser beam has a wavefront cross-section with an area greater than the size of the aperture and is incident upon the mask and the aperture to create the sub-beam.

Description

CROSS REFERENCE TO RELATED APPLICATION [0001] This application claims the benefit of U.S. patent application Ser. No. 10 / 329,036, filed Dec. 24, 2002 which claims priority of U.S. Provisional Application No. 60 / 375,741 filed on Apr. 26, 2002, the contents of which are incorporated herein by reference.FIELD OF THE INVENTION [0002] The present invention relates to precision laser micromachining. More specifically, it relates to a method of and a system for laser micromachining to obtain precise alignment of drilling laser beams and for fabricating products, having sub-micron features, with precision and accuracy. One embodiment may be used to fabricate photonic devices such as photonic crystals. BACKGROUND OF THE INVENTION [0003] Photonic devices and microphotonics provide exciting potential for furthering the advancement of technology historically served by microelectronics. Photonic devices may be used as frequency selection filters to enable large volumes of data to travel along op...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B23K26/066B23K26/382
CPCB23K26/04B23K26/0656B23K26/4075B23K26/043B23K26/381B23K26/382B23K26/066B23K26/40B23K2103/50
Inventor LI, MINGISHIZUKA, MAKOTOLIU, XINBING
Owner LI MING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com