Illumination system for a microlithography projection exposure apparatus

a technology of exposure apparatus and exposure system, which is applied in the direction of microlithography exposure apparatus, printers, instruments, etc., can solve the problems of substantially codetermination between image quality and wafer throughput that can be achieved with the apparatus, and achieve the effect of small coheren
US20060126049A1Inactive Publication Date: 2006-06-15CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
US · United States
Current Assignee / Owner
CARL ZEISS SMT GMBH
Publication Date
2006-06-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of coherence σ, it being possible to adjust the degree of coherence within a degree of coherence range extending into the range of very small degrees of coherence of significantly less than σ=0.2. The illumination system may have a first optical system for generating a predeterminable light distribution in an entrance plane of a light mixing device, and also a light mixing device for homogenizing the impinging radiation. The first optical system and the light mixing device can in each case be changed over between a plurality of configurations corresponding to different degree of coherence ranges. The degree of coherence ranges overlap and are dimensioned such that the resulting total degree of coherence range is larger than the individual degree of coherence ranges.
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Description

[0001] This application is a Continuation of International Patent Application PCT / EP2004 / 004875 filed on May 7, 2004, and claiming priority from German Patent Application DE 103 22 393.2 filed on May 12, 2003. Priority is claimed from German Patent Application DE 103 22 393.2 filed on May 12, 2003. The complete disclosure of these patent applications is incorporated into this application by reference.BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The invention relates to an illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with illumination radiation with a predeterminable degree of coherence.

[0004] 2. Description of the Related Art

[0005] The performance of projection exposure apparatuses for the microlithographic fabrication of semiconductor components and other finely patterned devices is substantially determined by the imaging properties of the projection objectives. Furthermore, the image qualit...

Claims

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