Use of viruses and virus-resistant microorganisms for controlling microorganism populations

a technology of microorganisms and viruses, applied in the field of viruses, can solve the problems of ineffective use of temperate viruses in controlling the populations of microorganisms, and achieve the effects of effectively controlling, reducing, or eliminating the populations of target strain microorganisms

Inactive Publication Date: 2006-07-13
OMNILYTICS INC
View PDF5 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0041] The viruses of the present invention may then be employed in a method of controlling, reducing, or eliminating populations of target strain microorganisms. The method includes introducing lytic viruses that are substantially devoid of undesirable genes into an environment where an undesirable target strain microorganism is present. As the target strain microorganism is exposed to the vi

Problems solved by technology

Moreover, the use of temperate viruses in controlling populations of microorganisms is often ineffec

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

first embodiment

[0068] Plant diseases that are caused by microorganisms may also be treated in accordance with this first embodiment of the method. The viruses that will infect target strains of plant disease-causing or harmful, e.g., ice-nucleation, microorganisms may be applied to infected or contaminated plants, seedlings, seeds, or soil or other matter which supports the foregoing by spraying or introduction into the plant's water supply. As an example of the treatment of plants, legume seed may be treated with a virus or virus mixture that will infect and lyse undesirable strains of rhizobia that are present in soil, and that will not infect beneficial strains of rhizobia. The virus, which preferably includes an h-mutant virus, will reduce or eliminate undesirable rhizobia strains, while the desirable rhizobia strains will benefit the plant as the plant grows.

[0069] The first embodiment of the method of the present invention may also be employed to control microorganism populations that are de...

second embodiment

[0076] As described previously, many beneficial microorganisms, or “beneficial agents,” perform beneficial processes. Such microorganisms, however, are susceptible to being infected and lysed by viruses. Accordingly, the method of the present invention includes the use of virus-resistant strains of beneficial microorganisms in beneficial processes.

[0077] Virus-resistant microorganisms are generated, as previous described, by growing a target strain of microorganism in the presence of wild-type and / or h-mutant viruses that will infect and lyse the target strain microorganism. Virus-resistant microorganisms may then be isolated as discussed previously, and proliferated in a growth medium under otherwise substantially sterile and preferably controlled conditions.

[0078] As an example of the use of the second embodiment of the process, virus-resistant Pantoea ananus, which is parasitic for the rust fungi, Puccinia spp., is useful for controlling the growth of rust fungus on wheat. Phage...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Timeaaaaaaaaaa
Electrical resistanceaaaaaaaaaa
Antimicrobial propertiesaaaaaaaaaa
Login to view more

Abstract

A lytic virus specific for a target strain of a microorganism and substantially free of undesirable genes may be utilized in processes including control of populations of microorganisms. The virus may include a host-range mutant, or “h-mutant.” A method for generating virus includes growing virus-resistant variants of a target strain of a microorganism in the presence of viruses that are specific for the target strain. Only h-mutant viruses will proliferate. Wild-type virus-resistant and virus-resistant variants of a microorganism are also disclosed, as are methods generating such variants. Methods for controlling target strain microorganisms include introducing virus into a treatment site where control of a population of a target strain microorganism is desired or introducing virus-resistant variants of a microorganism into treatment sites where the presence of the microorganism is desired.

Description

BACKGROUND OF THE INVENTION Technical Field [0001] The invention relates to viruses which control and prevent growth of harmful microorganisms and to processes which employ such viruses. It also relates to protection of helpful microorganisms from virus attack. In particular, the viruses of the present invention lack genes for virulence factors, toxins, antibiotic resistance, and other undesirable genes, and include host-range (h-mutant) viruses which are specific for wild-type virus-resistant strains of targeted microorganisms. More specifically, viruses of the present invention are lytic, thus they control and prevent further growth of harmful microorganisms that infect animals or plants by destroying these microorganisms. Such viruses may also be employed to develop and select strains of beneficial microorganisms which are resistant to wild-type and h-mutant viruses. [0002] Viruses are known to alter populations of microorganisms, such as bacteria, fungi, algae, and protozoa. It ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C12N15/74A61K35/76A01N63/20A01N63/40A23L5/20A61K35/741
CPCA01N63/00A23B4/20A61K35/76C12N7/00C12N2795/00032A01N2300/00A61K35/741A61K2300/00Y02A50/30A01N63/40A01N63/20
Inventor JACKSON, LEE E.SPENDLOVE, REX S.
Owner OMNILYTICS INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap