Magnetic media patterning via contact printing utilizing stamper having magnetic pattern formed in non-magnetic substrate
a technology of magnetic pattern and contact printing, which is applied in the field of forming magnetic transition patterns, can solve the problems of high cost of servo pattern writing equipment, time-consuming process, and inability to meet the requirements of the above-described method, and achieve the effect of avoiding the formation of magnetic pattern in the above-described method
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0088] The present invention addresses and solves problems and drawbacks attendant upon the use of stampers / imprinters with topographically patterned imprinting surfaces in performing high replication quality contact printing of recording layers of magnetic recording media for forming magnetic patterns therein, e.g., servo patterns, in a cost-efficient manner at high product throughput rates. Specifically, the present invention is based upon the discovery by the inventors that modification of the imprinting surface of the stamper / imprinter to eliminate the conventional topographical patterning thereof can provide a number of significant advantages, including, inter alia: (1) process simplification, as by eliminating the need for application of an external magnetic re-alignment field during the imprinting process; and (2) more rapid and more easily controllable processing of workpieces / substrates.
[0089] Key features of the present invention are the manufacture and use of improved st...
PUM
Property | Measurement | Unit |
---|---|---|
width | aaaaa | aaaaa |
width | aaaaa | aaaaa |
width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com