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Apparatus to Modify the Spatial Response of a Pattern Generator

a pattern generator and spatial response technology, applied in the field of lithography system, can solve the problem of defining the region of double exposure or no exposur

Inactive Publication Date: 2008-01-24
ASML HLDG NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides a method and apparatus for creating trapezoidal patterns on a substrate using a pattern generator device. The method includes directing a material towards the layer of the pattern generator device to form a coating and blocking at least some of the material from reaching the layer during this process. The shape of light reflected from the coating on the pattern generator device during operation forms a trapezoidal pattern. The invention also provides a method for modifying elements of the pattern generator by adding a radiation absorbing or scattering layer. Additionally, the invention provides a method for patterning a substrate by directing radiation towards a pattern generator with elements associated therewith and positioned to form trapezoidal patterns on the substrate. The invention also includes a method for modifying a spatial light modulator to aid spatial stitching of images projected by the SLM onto a substrate by adding a non-varying or continuously varying optical response to the SLM.

Problems solved by technology

However, any error in the distance the substrate is moved between exposures will lead to a finite region of either double exposure or no exposure on the substrate.

Method used

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Embodiment Construction

[0024] While specific configurations and arrangements are discussed, it should be understood that this is done for illustrative purposes only. A person skilled in the pertinent art will recognize that other configurations and arrangements can be used without departing from the spirit and scope of the present invention. It will be apparent to a person skilled in the pertinent art that this invention can also be employed in a variety of other applications.

[0025] One or more embodiments of the present invention provide systems and methods to modify a layer on a pattern generator substrate used to form a pattern generator. This modification is done before the layer is diced to form a plurality of programmable patterning devices making up the pattern generator. The modification produces a reflected light beam pattern reflecting from the pattern generator having a trapeziodal shape at an image plane.

[0026]FIG. 4 shows a portion of a layer 450 of a substrate 452 having overlapping trapez...

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Abstract

Systems and methods are used to modify a layer on a substrate that is used to form a pattern generator, so that light reflecting from the modified substrate has a trapezoidal or other custom profile. The layer is modified using various vapor deposition techniques in conjunction with moving or positioning the substrate a desired distance from a blocking device and / or at a desired rate or speed.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS [0001] This application is a divisional of U.S. application Ser. No. 10 / 898,160, filed on Jul. 26, 2004, which is incorporated herein by reference in its entirety.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention is related to a lithography system. [0004] 2. Background Art [0005] Pattern generators are used to form patterned radiation images in many environments. For example, pattern generators can be used in televisions, biomedical patterning applications, lithography, and the like. [0006] When used in lithography systems, the pattern generators are used to pattern substrates during an exposure process. Example lithography systems include, but are not limited to, reflective or transmissive maskless, immersion, and mask-based photolithography. Example substrates include, but are not limited to, semiconductor wafers, flat panel display substrates, flexible substrates, and the like. Light interacting with ...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C23C16/00B05C11/00
CPCC23C16/482G03F1/14G03F7/70291C23C16/042C23C14/044C23C14/24G03F7/70475G03F1/00G03F1/50
Inventor LIPSON, MATTHEWWILKLOW, RONALD A.
Owner ASML HLDG NV