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Evaporating apparatus, evaporating method and manufacturing method of evaporating apparatus

a technology of evaporating apparatus and manufacturing method, which is applied in the direction of vacuum evaporation coating, chemical vapor deposition coating, coating, etc., can solve the problems of high likelihood of contaminant adhesion to the target object, increased footprint, and large factory size, so as to reduce cross-contamination

Inactive Publication Date: 2010-04-29
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides an evaporating apparatus, method, and manufacturing method that can form multiple layers of film without the need for multiple processing chambers, reducing the likelihood of contamination and improving film quality. The apparatus uses a single vapor deposition source and a plurality of thin films to achieve this. The technical effect is the ability to form multiple layers of film in a single processing chamber while reducing cross-contamination.

Problems solved by technology

However, in view of the foregoing, if there is a need of one processing chamber to form a single layer of a film, there is a need of a plurality of processing chambers to form a plurality of film layers on a target object and thus a footprint is increased.
As a result, a factory becomes large-scaled and there is a high likelihood that a contaminant is adhered onto the target object during transfer of the target object.
However, in this case, there is likelihood that the film forming molecules discharged from one vapor deposition source are mixed with the film forming molecules discharged from the adjacent vapor deposition source (i.e., cross-contamination) and thus a film quality of each layer may be deteriorated.

Method used

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  • Evaporating apparatus, evaporating method and manufacturing method of evaporating apparatus
  • Evaporating apparatus, evaporating method and manufacturing method of evaporating apparatus
  • Evaporating apparatus, evaporating method and manufacturing method of evaporating apparatus

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Experimental program
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Effect test

experiment 2

[0090](Experiment 2)

[0091]In order to further prove a straight travelling property of a film forming molecule, the inventor carried out an experiment again in a state that the gap G was changed from 6 mm to 2 mm and a position of the stage 130 was changed so as to set a distance in an X-axis direction from the center of the blowing device 110 to the center of the substrate W to be 116 mm, as illustrated in FIG. 7.

[0092](Result of Experiment 2)

[0093]After the experiment, the inventor controlled a UV light to be irradiated onto the entire surface of the substrate W but a light hν was not radiated from any place. If film forming molecules of Alq3 was adhered to the substrate W, the film forming molecule M was excited by energy of the irradiated UV light and then the light hν was radiated when the film forming molecule M returned to a ground state, the inventor concluded that in case that the gap G was changed from 6 mm to 2 mm and the position of the stage 130 was changed so as to set ...

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Abstract

An evaporating apparatus includes: a plurality of vapor deposition sources for respectively vaporizing different film forming materials accommodated therein; a plurality of blowing devices for blowing off film forming materials vaporized from the vapor deposition sources through blowing openings; and one or more partition walls for separating the adjacent blowing devices. The one or more partition walls are installed such that relationships of a gap G between each partition wall and the substrate, a height T from each blowing opening to a top surface of each partition wall, a thickness D of each partition wall and a distance E from a center position of each vapor deposition source to a center position of each partition wall satisfy an inequality of E<(G+T)×D / 2G. Further, an internal pressure of the processing chamber is controlled to be about 0.01 Pa or less.

Description

TECHNICAL FIELD[0001]The present invention relates to an evaporating apparatus, an evaporating method and a manufacturing method of the evaporating apparatus. In particular, the present invention relates to contamination within the evaporating apparatus.BACKGROUND ART[0002]Widely employed in a manufacturing process of an electronic device such as a flat panel display or the like is an evaporating method for forming a film on a target object by adhering gas molecules, which are generated as a result of vaporizing a preset film forming material, to the target object. Among various types of devices manufactured by using such an evaporating technology, an organic EL display is particularly known to be superior to a liquid crystal display for the reason of its self-luminescence, high reaction speed, low power consumption and so forth. Accordingly, increasing demands for the organic EL display are expected from now on, and it is attracting high attention in the field of manufacture of the...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C23C16/44C23C16/00
CPCB01B1/005C23C14/562C23C14/22H01L21/02263H10K50/11H10K2102/351
Inventor SUDOU, KENJI
Owner TOKYO ELECTRON LTD