Magnetic head slider having ultra thin base layer with group 6a element and protective layer
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
examples
[0044]In the examples described below, the advantages of the present invention were confirmed by changing the composition and the film thickness of the seed layer and the film thickness of the protective film as parameters, and a suitable numeric range of each parameter was examined. Multi Deposition System MR3, a product from Shimadzu Corporation, was used to form the seed layer and the protective film. The system is capable of performing IBE, sputtering and FCVA. First, the surface of the lapped row bar was etched by means of IBE so that the PTR was adjusted into a desired shape. Adjustment of the PTR was performed by controlling, for example, the angle and power of ion beam. Next, the seed layer was formed by using a target of Si or the like. A predetermined amount of Ar gas was introduced into the sputtering chamber, and RF or pulsating DC was applied to cause discharge, thereby the seed layer having a desired thickness was formed. Thereafter, the protective film made of DLC was...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


