Electron beam irradiation apparatus
a technology of irradiation apparatus and electron beam, which is applied in the field of electric beam irradiation apparatus to achieve the effect of suppressing the influence of electric fields
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
embodiment 11
[0035]In the following description, examples will be described in which by properly adjusting voltages to be applied to the BSE detectors acting as deflectors, an axial shift due to the deflectors will be suppressed. In one example, with the aim for adjusting voltages to be applied to N electrodes (for example, scintillators), voltages to be applied to (N−2) of these electrodes may be fixed and remaining 2 voltages may be adjusted. If all of the N voltages are made variable, a solution cannot be determined definitely and automatic adjustment cannot be executed.
[0036]Specifically, an instance of the number of electrodes N=4 will be described (FIG. 4A). Examples applicable to N≧3 can be generalized with ease. When an amount of shift of the primary beam (shift of field of view or movement of a pattern on the SEM screen) is expressed by (xi, yi), (i=1, 2, 3, 4), under application of voltage to only an i-th electrode (i=1, 2, 3, 4), conditions for preventing the primary beam from axially...
embodiment 2
[0072]Referring now to FIG. 5, an example of a user interface (GUI) will be described which is used when conducting adjustment. The adjustment is carried out in order as below. It will be appreciated that a GUI screen exemplified in FIG. 5 is displayed on a display unit not shown. Then, through setting using the GUI screen, operation conditions of the operation condition program stored in the memory built in the controller device 1231 emplified in FIG. 12 are set.
[0073](i) A pattern for marking is moved to the center of screen (FIG. 4D). After voltages are applied to the electrodes, the pattern is moved by an amount corresponding to a shift amount of primary beam (Xi, Yi) on an observing sample (FIG. 4E).
[0074](ii) The number of electrodes (N in FIG. 5) is inputted. In this example, an instance of N=4 will be described but generally, in the case of N≧3, adjustment can be executed in a similar manner.
[0075](iii) Voltage values to be applied to the individual detectors are inputted. I...
embodiment 3
[0084]When the field of the scanning of primary beam is wide (low magnification observation) or when the image shift amount (a shift amount of the central primary beam from the optical axis) is large, the amount of adjustment of voltage differs for an area close to the optical axis and for an area distant from the optical axis. In FIG. 7A, a primary beam 701 is deflected by means of a deflector 702, passes through an objective lens 707 and irradiates on a sample 708. A trajectory 705 runs through the optical axis and the primary beam is deflected to the maximum during scanning to travel through a trajectory 706. In FIG. 7B, when the image shift is zero, the trajectory 705 is held but when deflection by the image shifter 703 affects, a trajectory 706 participates. In the case of this example, shifting of the field of view is executed within a field of view movable range 709. The distances from the electrode 704 to the trajectories 705 and 706 differ from each other and strictly, amou...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More