Apparatus for producing aligned carbon nanotube aggregates
a carbon nanotube and aggregate technology, applied in the direction of aligned nanotubes, chemical/physical/physicochemical processes, coatings, etc., can solve the problems of difficult to produce a cnt aggregate large in specific surface area with moldability and processability, and the catalyst is easily deactivated, so as to reduce the quantity of hydrocarbon gas, reduce the quantity of carbon contaminants, and reduce the quantity of catalyst activation materials
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example 1
[0156]A specific example is given below to describe in detail an apparatus according to the present invention for producing aligned CNT aggregates.
[0157]The following describes conditions for production of a substrate supporting a catalyst. A base substrate used was Fe—Ni—Cr alloy YEF 426 (Ni 42%, Cr 6%; manufactured by Hitachi Metals, Ltd.) having a size of 40 mm×40 mm with a thickness of 0.3 mm. A surface roughness of the base substrate was measured by use of a laser microscope, and it was found that an arithmetic average roughness of the base substrate was Ra≈2.1 μm. Alumina layers with a thickness of 100 nm were formed on both front and back surfaces of the base substrate by use of a sputtering apparatus. Then, an iron layer (catalyst metal layer) with a thickness of 1.0 nm was formed only on the front surface of the base substrate by use of the sputtering apparatus.
[0158]FIG. 1 shows a production apparatus of the present example. The substrate supporting the catalyst thereon wa...
example 2
[0168]The following describes conditions for producing a catalyst substrate. A base substrate used was Fe—Ni—Cr alloy YEF 426 (Ni 42%, Cr 6%; manufactured by Hitachi Metals, Ltd.) having a size of 90 mm×90 mm with a thickness of 0.3 mm. A surface roughness of the base substrate was measured by use of the laser microscope, and it was found that an arithmetic average roughness of the base substrate was Ra≈2.1 μm. Alumina layers with a thickness of 20 nm were formed on both front and back surfaces of the base substrate by use of the sputtering apparatus. Then, an iron layer (catalyst metal layer) with a thickness of 1.0 nm was formed only on the front surface of the base substrate by use of the sputtering apparatus.
[0169]FIG. 2 shows a production apparatus of the present example. The production apparatus included an inlet purge section 101, a formation unit 102, gas mixing prevention means 103, a growth unit 104, a cooling unit 105, an outlet purge section 106, a transfer unit 107, and...
example 3
[0195]The conditions for producing a substrate supporting a catalyst is identical to those in Example 1. Further, the production device and the production conditions of the present example are identical to those in Example 1 except materials of the synthesizing furnace, the substrate holder and the gas ejection section, and surface treatment thereof. The synthesizing furnace, the substrate holder and the gas ejection section of the present example were made from Inconel 601, and surfaces thereof were sandblasted, and polished by a sand paper or a polishing agent so as to have an arithmetic average roughness Ra of 1.4 μm to 1.9 μm (the surface roughness was measured within 293 μm in z direction).
[0196]An aligned CNT aggregate was continuously produced under the above conditions. Although properties of the aligned CNT aggregate that is produced according to the present example depends on the details of production conditions, a typical aligned CNT aggregate had a density of 0.03 g / cm3,...
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