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Method and device for aligning a charged particle beam column

A technology for aligning charged particles and holes, applied in the field of generating images that align charged particle beams, automatic alignment and automatic correction of aberrations, to achieve the effect of easy automatic focusing and stable imaging conditions

Inactive Publication Date: 2007-10-03
APPL MATERIALS ISRAEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, particularly when considering on-line monitoring systems or on-line beam writers, there are further problems related to the alignment of charged particle beam trains, and the improvements seen in the prior art require further refinement

Method used

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  • Method and device for aligning a charged particle beam column
  • Method and device for aligning a charged particle beam column
  • Method and device for aligning a charged particle beam column

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Embodiment Construction

[0038] First, it should be appreciated by those skilled in the art that the present invention can be used with any charged particle device. For convenience, however, the invention will be described for its implementation in a scanning electron microscope (SEM). Those skilled in the art will also appreciate that all discussions herein of voltage and potential refer to relative rather than absolute relationships. For example, by connecting the cathode to "ground" and applying a 3Kv accelerating beam to the sample is equivalent to applying negative 3Kv to the cathode and placing the sample to ground. Thus, where certain discussions are provided in terms of specific voltages for convenience, it should be understood that references are relative potentials.

[0039] A simplified block diagram of an electron microscope is shown in FIG. 1 . The electron microscope 100 includes an electron gun 103 emitting an electron beam 101 which is extracted by an anode 104 . The objective lens ...

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Abstract

The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.

Description

technical field [0001] This invention relates generally to charged particle trains, and more particularly to methods and apparatus for producing images of aligned charged particle beam trains. More specifically, the invention relates to automatic alignment of charged particle beams and automatic correction of aberrations. Background technique [0002] Technologies such as microelectronics, micromechanics and biotechnology are in high demand in industry for the formation and detection of samples in the nanometer scale. At such small scales, probing and structuring are often performed using electron beams generated and focused in charged particle beam devices such as electron microscopes or electron beam pattern generators. Charged particle beams, due to their short wavelength, offer a very high spatial resolution which is comparable, for example, to photon beams. [0003] However, the resolution is reduced due to the inherent aberrations and misalignments of charged particl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/26H01J37/28G21K5/04G01T1/29G03F7/20H01JH01J37/04H01J37/153H01J37/21H01J37/22H01J37/305H01L21/027
CPCH01J2237/1501H01J2237/045H01J2237/1532H01J2237/221H01J37/263H01J2237/216H01J37/304H01J37/1471
Inventor 艾舍·珀尔
Owner APPL MATERIALS ISRAEL LTD