High precision silicon slice bench and positioning method thereof
A positioning method and technology for a silicon wafer table, which are applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problem that the high-precision positioning of silicon wafers cannot be satisfied, the dynamic and static friction coefficients are difficult to be consistent, and the manufacturing accuracy of semiconductor equipment is affected. and other problems, to achieve the effect of fast operation and response speed, low frictional resistance of movement, easy installation and replacement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0038] Such as figure 1 , 2 The high-precision silicon wafer stage shown includes an air bearing 1, a leveling mechanism 2, a plane motor 3, and a reed 4 connected sequentially from bottom to top. The top of the reed 4 is a square mirror 5. The upper surface is provided with a suction cup 6 for placing silicon wafers.
[0039] The present invention uses the double-rigidity air bearing 1 as the base, uses it to isolate the vibration of the frame, reduces motion friction, eliminates the manufacturing error of the base platform, and ensures the speed stability of the scanning motion. In addition, it can also prevent the shear pressure caused by the micro displacement caused by the overturning moment in the acceleration process on the air bearing guide rail. To overcome the problem of high-precision positioning of silicon wafers at high speed and high acceleration. The characteristics of the air bearing 1 are: extremely small movement friction resistance, extremely low calorifi...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com