Vacuum coating device

Abstract

The invention relating to a vacuum plating device, which contains a vacuum chamber, a rotation supporting assembly, a substrate support lying in vacuum chamber and containing a few substrates and also connected to rotation supporting assembly, and a deposition source lying in the vacuum chamber and opposite the substrate support, further contains a turning device lying in the vacuum chamber and connected to substrate support, and a turning control device out of the vacuum chamber, with the turning device and turning control device, several substrates rotating horizontally in the vacuum chamber. With the invented plating device, no need of cooling and breaking vacuum after one surface of the substrate is coated, the heat-up and pump-down times decrease.

Description

【Technical field】 [0001] The invention relates to a coating device, in particular to a vacuum coating device with a workpiece supporting frame which can be directly turned over in a vacuum chamber. 【Background technique】 [0002] Optical thin films basically achieve their effects through interference, which means that one or more layers of dielectric films or metal films or dielectric film stacks or metal film stacks are coated on optical components or independent substrates. Change the transmission characteristics of light waves. At present, many optical instruments, such as sensors, semiconductor lasers, interferometers, myopia glasses, sunglasses, and optical fiber communications, all require optical films. [0003] At present, the physical vapor deposition method (Physics Vapor Deposition, referred to as PVD) is the main method for optical film production. This method is to convert the film material from solid state to gaseous or ionic state. The gaseous or ionic state ...

AI Technical Summary

Problems solved by technology

[0004] However, in the existing vacuum coating equipment, only one side of the substrate can be coated at a time. If you want to coat it on both sides, you need to break the vacuum. When it needs to be cooled and taken out, turned over and then put back into the vacuum chamber, it needs to be reheated and evacuated at this time, as announced in Chinese Utility Model Patent No. 00212144.1 on March 7, 2001, which discloses a vacuum coating device, It consists of a sample holder driven by a stepping motor installed in the vacuum chamber, a target, an ion source, a heating source, a substrate holder driven by an AC speed regulating motor, and a mechanical pump and a molecular pump installed outside the vacuum chamber

Although this vacuum coating device can perform double-sided coating on the substrate by breaking the vacuum, it needs to break the vacuum, which will increase the coating cycle and the number of times of vacuuming, and cannot maintain the consistency of the parameters of the vacuum degree of the vacuum chamber. , which will make the film characteristics of the double-sided coating layer of the substrate inconsistent

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