Electro-optical device, electronic apparatus, and method of manufacturing electro-optical device
An electro-optical device and electrode technology, which is used in semiconductor/solid-state device manufacturing, optics, circuits, etc., can solve the problem of lowering the withstand voltage of storage capacitors, and achieve the effects of preventing capacitance deviation, improving reliability, and preventing surface damage.
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Embodiment approach 1
[0044] (Overall configuration of liquid crystal device)
[0045] figure 1 (a) and (b) are a plan view of a liquid crystal device (electro-optical device) and components formed thereon viewed from the counter substrate side, and a H-H' sectional view thereof, respectively. exist figure 1 In (a) and (b), the liquid crystal device 1 of this mode is TN (Twisted Nematic, twisted nematic) mode, ECB (Electrically Controlled Birefringence, electrically controlled birefringence) mode, or VAN (Vertical Aligned Nematic, vertically aligned Nematic) mode transmissive active matrix liquid crystal device. In this liquid crystal device 1 , the element substrate 10 and the counter substrate 20 are bonded together via a sealing material 22 , and the liquid crystal 1 f is held therebetween. In the element substrate 10, IC60 for driving the data lines and IC30 for driving the scanning lines are mounted in the COG (Chip On Glass) method in the end region located outside the sealing material 2...
Embodiment approach 2
[0083] Figure 6 (a) and (b) are a plan view of one pixel of the liquid crystal device according to Embodiment 2 of the present invention, and a cross-sectional view when the liquid crystal device is cut at a position corresponding to A2-B2. Figure 7 (a) to (g) are cross-sectional views showing steps up to forming source and drain electrodes among the manufacturing steps of the element substrate 10 used in the liquid crystal device 1 of this embodiment. exist Figure 6 In (a), the pixel electrode is represented by a thick and long dotted line, the gate line and the film formed simultaneously are represented by a thin solid line, the source line and the film formed simultaneously are represented by a thin single dotted line, and the thin film formed simultaneously is represented by a thin solid line. And short dashed lines indicate semiconductor layers. In addition, the portion corresponding to the dielectric layer constituting the storage capacitor is shown by a thin dashed...
Embodiment approach 3
[0094] Figure 8 (a) and (b) are a plan view of one pixel of the liquid crystal device in Embodiment 3 of the present invention, and a cross-sectional view when the liquid crystal device is cut at a position corresponding to A3-B3. Figure 9 (a) to (g) are cross-sectional views showing steps up to forming source and drain electrodes among the manufacturing steps of the element substrate 10 used in the liquid crystal device 1 of this embodiment. exist Figure 8In (a), the pixel electrode is represented by a thick and long dotted line, the gate line and the film formed simultaneously are represented by a thin solid line, the source line and the film formed simultaneously are represented by a thin single dotted line, and the thin film formed simultaneously is represented by a thin solid line. And short dashed lines indicate semiconductor layers. In addition, the portion corresponding to the dielectric layer constituting the storage capacitor is shown by a thin dashed-two dotted...
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Abstract
Description
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