Method for preparing triiodomethane silicane
A technology of iodotrimethylsilane and hexamethyldisilane, which is applied in the field of halosilane preparation, can solve the problems of large copper powder consumption, reduced production cost, troublesome iodine recovery, etc., and achieves low production cost, reduced decomposition, Simple operation effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0011] The specific embodiment of the present invention is described below:
[0012] A preparation method of iodotrimethylsilane, using hexamethyldisilane as raw material and refined iodine as raw material, the preparation method comprises the following steps:
[0013] (1) Put 500 kilograms of hexamethyldisilane (more than 99.5% by mass) into a 1000-liter reactor, heat up and start stirring until the liquid phase temperature of hexamethyldisilane rises to 65 degrees Celsius , add refined iodine in batches, that is, add 10kg in each batch, add the next batch after the added refined iodine has reacted, add 870 kg in total, and control the temperature of the whole feeding process within the range of 65-95 degrees Celsius. After the addition is complete, heat the reaction system to 100-110 degrees Celsius to form reflux, and allow the reaction system to reflux at this temperature for 6 hours to react the raw materials to generate crude iodotrimethylsilane;
[0014] (2) Add 7.5 kg...
PUM

Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com