Excimer laser and line narrowing module

A technology of excimer lasers and lasers, which is applied in the direction of lasers, phonon exciters, laser components, etc., can solve problems such as production yield reduction and exposure failure

Inactive Publication Date: 2007-07-25
SAMSUNG ELECTRONICS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When the DOF is reduced, there will be exposure failure, which will lead to a decrease in production yield

Method used

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  • Excimer laser and line narrowing module
  • Excimer laser and line narrowing module
  • Excimer laser and line narrowing module

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Embodiment Construction

[0027] The present invention will now be described with reference to the accompanying drawings, in which exemplary embodiments of the present invention are shown. However, the present invention can be implemented in many different forms and should not be construed as being limited to the embodiments set forth herein. On the contrary, these embodiments are provided so that this disclosure will be thorough and complete, and will convey the scope of the present invention to those skilled in the art.

[0028]FIG. 1 is a diagram showing an excimer laser 100 according to an exemplary embodiment of the present invention. The excimer laser 100 is composed of a generator 10, a spectral line compression module 20 and an output connector 30. The generator 10 is used to excite a luminescent material such as a halogen gas or an inert gas to generate an excimer laser. The spectral line shrinking module (LNM) 20 communicates with the generator 10 and is used to shrink the excimer laser spectral ...

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Abstract

An excimer laser and a line-narrowing module capable of increasing and maximizing production yield in semiconductor manufacturing are disclosed. The line-narrowing module utilizes a beam expander that passes laser light, produced by and incident from a generator of the excimer laser and collimates the laser light in one direction. A diffraction grating receives the collimated laser light and diffracts the laser light and causes a traveling direction of the laser light to be separated according to an associated wavelength of the laser light. A multi-wavelength reflector located at a reflecting position on one side between the diffraction grating and the beam expander in order to re-enter the laser light having a multi-wavelength into the generator through the beam expander. The multi-wavelength reflector reflects the laser light consisting of a plurality of wavelengths among the laser light whose traveling direction is separated from the diffraction grating onto the beam expander.

Description

[0001] This application claims the rights of Korean Patent Application No. 10-2006-0006081 filed on January 20, 2006, the disclosure of which is fully incorporated herein by reference. Technical field [0002] The embodiment of the present invention relates to a semiconductor manufacturing equipment, and more specifically, to an excimer laser used as a light source in an exposure device for sensitizing a photoresist formed on a wafer, and a spectrum associated therewith. Line narrowing module (line narrowing module). Background technique [0003] Currently, with the rapid development of the information communication field and the popularization of information media such as computers, semiconductor equipment is developing significantly. Semiconductors are needed to ensure the high-speed operation of these devices, and semiconductors also provide large storage capacity. Therefore, technologies for constructing semiconductor devices have been developed to optimize the integration, re...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/35G03F7/20H01S5/00G02B5/18
CPCH01S3/225H01S3/041G03F7/70575H01S3/0812H01S3/2256H01S3/105H01S3/036G03F7/70025G03F7/70233G03F7/70308
Inventor 金壮鲜
Owner SAMSUNG ELECTRONICS CO LTD
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