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Colorful filter and its production method, liquid crystal display and its production method

A color filter and extinction layer technology, applied in optics, optical components, nonlinear optics, etc., can solve the problems of high reflectivity, low reflectivity optical performance, low reflectivity of color filters, etc. performance, the effect of reducing the reflectance of light

Inactive Publication Date: 2007-10-24
INNOCOM TECH SHENZHEN +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In order to solve the problem that the above-mentioned color filter has high reflectivity and poor optical performance, it is necessary to provide a color filter with low reflectivity and high optical performance
[0010] In order to solve the problem of high reflectivity and poor optical performance of the above-mentioned color filter, it is necessary to provide a method for manufacturing a color filter with low reflectivity and high optical performance.

Method used

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  • Colorful filter and its production method, liquid crystal display and its production method
  • Colorful filter and its production method, liquid crystal display and its production method
  • Colorful filter and its production method, liquid crystal display and its production method

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Embodiment Construction

[0027] Please refer to FIG. 3 , which is a schematic diagram of a color filter disclosed in a preferred embodiment of the present invention. The color filter 3 includes: a base layer 30, a black matrix 31 arranged on the base layer 30, a colored layer 32 arranged at the interval between the black matrices 31, a matting layer 33 arranged on the surface of the black matrix 31 And a transparent conductive layer 34 disposed on the surface of the colored layer 32 and the matting layer 33 .

[0028] The base layer 30 is a transparent glass substrate, and the transparent glass substrate serves as a carrier for other components of the color filter 3 .

[0029] The black matrix 31 is formed on the surface of the base layer 30 and is regularly arranged in a grid pattern. It uses chromium and its metal compounds as materials, such as sputtering chromium (Cr), a mixture of chromium and chromium oxide (CrOx / Cr) or nickel ( Ni), forming a black matrix through a photoresist photolithography...

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Abstract

The invention relates to a colorful filter and a relative production, also relates to a liquid crystal display device and a relative production. The production of the colorful filter comprises that preparing a substrate, preparing a black matrix on the surface of the substrate, forming a dyed layer on the surface of the substrate alternatively distributed with the black matrix on the surface of the substrate, forming an extinction layer on the surface of the black matrix, and forming a transparent conductive film on the extinction layer and the dyed layer. The invention also provides a liquid crystal display device which uses the colorful filter and a relative production. The inventive colorful filter has low light index of reflection, to improve the display quality of the liquid crystal display device which utilizes the colorful filter.

Description

【Technical field】 [0001] The invention relates to a manufacturing method of a color filter and a manufacturing method of a liquid crystal display device. 【Background technique】 [0002] The liquid crystal display device is a passive display device. In order to achieve the effect of color display, a color filter needs to be provided for it. Different color images are displayed by other components such as liquid crystals. [0003] Please refer to FIG. 1 , which is a schematic diagram of a manufacturing method of a color filter in the prior art. The manufacturing method of the color filter 20 includes: making a glass base layer 24; forming a black matrix 23 on the surface of the glass base layer 24; ), green (G) three coloring units; then, a transparent electrode layer 21 is formed on the surface of the coloring layer 22, and the transparent electrode layer 21 is indium tin oxide (Indium Tin Oxide, ITO). [0004] The glass substrate 24 serves as a carrier for the above-menti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/23G02F1/1335G02F1/136H01L27/00
Inventor 詹家明卓宏升
Owner INNOCOM TECH SHENZHEN
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