IDT/h-BN/c-BN/diamond multi-layer film structure surface acoustic wave device and its manufacture method
A surface acoustic wave device and multi-layer film technology, which is applied in the direction of electrical components, impedance networks, etc., can solve problems such as the inability to perform energy conversion between electromagnetic waves and surface acoustic waves
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[0018] The preparation method of the present invention is divided into the following steps:
[0019] 1. Using the microwave plasma CVD method, on the "mirror" silicon, the deposition parameters are controlled by a microcomputer program, and the nano-diamond film is continuously deposited step by step. The specific steps are as follows:
[0020] ①Using ZL 02141713X "Seedless crystal and unbiased diamond film deposition method", a very thin diamond-like carbon film transition layer is deposited on the surface of the high-resistance "mirror" silicon substrate; the mixed gas ratio is 86% (Ar): 10%(H 2 ): 4% (CH 4 ); The microwave power is 5000W, the mixed gas flow is 600sccm, and the substrate temperature is 700℃. Deposit for 10 minutes (the film thickness is about 0.4~0.5μm);
[0021] ②High-density nucleation on the surface of the diamond-like carbon film: The ratio of the mixed gas is controlled and adjusted by a computer program, and the ratio of the mixed gas slowly becomes 50% (A...
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[0033] Example 1:
[0034] 1. First prepare the nano-diamond film whose surface is terminated with hydrogen:
[0035] Using the microwave plasma CVD method, on the "mirror" silicon, the deposition parameters are controlled by a microcomputer program, and the nano-diamond film is continuously deposited step by step. The specific steps are as follows:
[0036] ①Using ZL 02141713X "Seedless crystal and unbiased diamond film deposition method", a very thin transition layer of diamond-like film is deposited on the surface of the high resistance "mirror" silicon substrate; the mixed gas ratio is 86% (Ar): 10%(H 2 ): 4% (CH 4 ); microwave power 5000W, mixed gas flow 600sccm, substrate temperature 700℃. Deposition for 10 minutes (the film thickness is about 0.4~0.5μm);
[0037] ②High-density nucleation on the surface of the diamond-like carbon film: The ratio of the mixed gas is controlled and adjusted by a computer program, and the ratio of the mixed gas slowly becomes 50% (Ar): 47% (H 2...
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