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Method and system for virtual metrology

A technology of measuring and measuring data, which is applied in the field of virtual measurement system, can solve the problems of increasing product cycle time and achieve the effect of improving cycle time

Active Publication Date: 2007-11-07
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These additional manual operations will increase the cycle time of the product

Method used

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  • Method and system for virtual metrology
  • Method and system for virtual metrology
  • Method and system for virtual metrology

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Embodiment Construction

[0027] In order to make the above and other objects, features and advantages of the present invention more comprehensible, preferred embodiments are listed below and described in detail in conjunction with the accompanying drawings.

[0028] The present invention discloses a system framework suitable for a virtual measurement application system. The virtual measurement application system can be used to convert system equipment control system information into process and tool performance information of manufacturing equipment. Program and tool performance information is also called forecast data. Combining predictive data with different tools can replace or enhance existing physical metrology operations and tools.

[0029] According to an embodiment of the present invention, the virtual measurement application system provides a data pre-processing mechanism for collecting measurement data sensed by manufacturing equipment in real time and performing pre-processing on the measu...

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Abstract

The present invention provides a method and a metrology system which are especially suitable for semiconductor manufacturing are provided in this patent. Process data and metrology data are received. Prediction data is generated from the process data and metrology data using a learning control model. The virtual measuring system which is suitable for manufacturers is composed of a fault detection and classification system which receives process data, a statistical process control system which performs statistical process control on a history of physical metrology data to form metrology data, a virtual metrology application system which generates prediction data based on the process data and the metrology data using a learning control model. The method and the metrology system presented in this patent can shorten production period through lowering application procedures or tool measuring parameters.

Description

technical field [0001] The invention relates to a semiconductor manufacturing, in particular to a virtual measurement system and method suitable for semiconductor manufacturing. Background technique [0002] In the semiconductor manufacturing industry, the purpose of metrology operations is to ensure the quality of semiconductor devices. These operations include process qualification, tool qualification, daily tool monitoring, periodic tool maintenance, tool recovery monitoring, process control monitoring and product monitoring. Currently, these operations are achieved through operators operating measurement tools. However, the cost of obtaining metrology tools is very high. Furthermore, in addition to the main process steps, additional manpower is required to operate the measurement tool. These additional manual operations will increase the cycle time of the product. Contents of the invention [0003] In view of this, the present invention provides a measurement meth...

Claims

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Application Information

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IPC IPC(8): G05B13/02G05B19/048
CPCG05B19/41875G05B2219/32193G05B2219/45031Y02P90/02
Inventor 张永政傅学士王英郎郑芳田
Owner TAIWAN SEMICON MFG CO LTD
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