Synthetic wave interference nano surface tri-dimensional on-line measuring system and method

A measurement system and measurement method technology, applied in the field of optical measurement, can solve the problems of complex scanning mechanism, high instrument cost, and slow measurement speed, and achieve the effect of simple scanning mechanism, high measurement accuracy and fast measurement speed

Inactive Publication Date: 2008-01-16
BEIJING JIAOTONG UNIV
View PDF0 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] 1. They are all point scanning measurement methods, the measurement speed is slow, two-dimensional scanning is required for three-dimensional surface measurement, the scanning mechanism is complicated, and the instrument cost is high;
[0009] 2. It is sensitive to interference such as measurement en

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Synthetic wave interference nano surface tri-dimensional on-line measuring system and method
  • Synthetic wave interference nano surface tri-dimensional on-line measuring system and method
  • Synthetic wave interference nano surface tri-dimensional on-line measuring system and method

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0023] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0024] As shown in Figure 3, the light with a spectral width of 40nm emitted by a superluminescent diode SLD with a center wavelength of 850nm is collimated into a parallel beam after passing through the fiber self-collimating lens Z, and the parallel beam is dispersed by the grating G to become a continuous and uniform wavelength in space Distributed fan-shaped light sheet, this fan-shaped light sheet is collimated into a parallel light sheet with continuous and uniform distribution of wavelength in space after passing through the collimating lens L1, and the parallel light sheet is obliquely incident on the parallel glass plate P with the thickness d of the coating on both sides, parallel The upper surface of the glass plate P is coated with a partial reflective film, and the lower surface is coated with a reflective film with a reflectivity o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a nano-surface interference 3D online measurement method with composite wave and by light scanning and the system thereof. The range depends on the wavelength of the composite wave, and the system has a common path interference structure. The beam with spectral width of 40 nm is color dispersed into two sectored lights with wavelength continuously and uniformly distributed in space by a grating, the two sectored lights are collimated to two parallel lights with transverse misplacement and partial overlapping, and the overlapped part forms a composite wave. The parallel lights of the composite wave passes through a plano-convex focusing lens with a cylindrical surface coated with a semi-transmitting and reflective film, then one half of the lights are reflected to become reference light and the other half of the lights are focused to become light, and then the light is reflected by different measuring points, interfered with the reference light and detected by an array CCD. If the phase variation of the interference signal of each pixel of CCD is measured, then the longitudinal variation at the measuring point can be obtained. The nano-surface 2D measurement is finished by once location; and the nano-surface 3D measurement is finished by transverse scanning of light. The measurement range is 600-1,000 micron, and the resolution is higher than 5 nm. The invention has the advantages of high measurement speed, and low cost; and is suitable for measurement of nano-surface with boss and deep groove.

Description

technical field [0001] The invention relates to a synthetic wave interference nanometer surface three-dimensional online measurement method and system using light scanning, in particular to a nanometer surface three-dimensional online measurement method and system with a boss and deep groove structure, belonging to the field of optical measurement technology . Background technique [0002] [1] D.P. Hand, T.A. Carolan, J.S. Barton, and J.D.C. Jones, Optics Letters, 1993, Vol. 18, No. 16, pp. 1361-1363. The working principle of the prior art document [1] is shown in Figure 1. The light emitted by the semiconductor laser passes through the Faraday isolator and the optical fiber 50:50 coupler, and then reaches the measuring head. The measuring head is a Fizeau interferometer, and a part of the light is The reflection of the end face of the fiber is used as the reference light, and the other part of the light is projected onto the measured surface after being focused by the self...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01B11/00G01B11/02G01B11/24G01B9/02G02B27/00
Inventor 谢芳
Owner BEIJING JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products