Method for converting standard process layout to system-level mode in micro-electromechanical system
A micro-electro-mechanical system and conversion method technology, applied in the direction of electrical digital data processing, special data processing applications, instruments, etc., can solve the problem that the overlapping parts of the components of the process layout cannot be automatically resolved, etc.
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[0020] Referring to Fig. 2, the present invention takes a single-mass flat Z-axis micro-accelerometer as an example to illustrate the conversion method from the standard process layout to the system-level model.
[0021] 10 in Fig. 3 is the technical layout of single-mass flat plate Z-axis micro-accelerometer, the structure includes eight beam assemblies 11, four anchor point assemblies 12, and a quality flat plate assembly 13; first, extract the geometry of the structure from the standard layout file Information and topological information, after judging, classifying and calculating the extracted information, the layout components are classified into units in the component library, including beam components 11, anchor point components 12, mass plate capacitor components 13, plate capacitor components 15, etc., and then Convert the layout component library 18 to correspond to the MEMS component library 24 in the system level, including the beam element 25, the anchor point elem...
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