Unlock instant, AI-driven research and patent intelligence for your innovation.

Hard film and hard film-coated material

A hard film and coating technology, applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of unsatisfactory sintering resistance, poor sintering resistance, and non-durability, etc., and achieve good sliding properties , Excellent wear resistance and low friction coefficient

Inactive Publication Date: 2008-02-13
KOBE STEEL LTD
View PDF4 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The composite nitride containing more than two kinds of Cr, Al, Ti, and V disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 2000-144376 has high hardness and good wear resistance, but the sintering resistance is not ideal, for example, in higher It is not durable when used under severe environmental conditions, such as when performing metal plastic processing under high surface pressure
Among Ti, V, Al, Cr, and Si disclosed in JP-A-2002-307128, one or more nitrides, carbides, and carbonitrides also have high hardness and poor sintering resistance.
In order to improve the seizing resistance, when sulfides are formed as disclosed in JP-A-2002-307129 and JP-A-2000-1768, the sulfides are soft and have excellent sliding properties at the initial stage of use. Abrasion occurs with prolonged use, causing problems with long-term durability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hard film and hard film-coated material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043]In order to achieve the above object, the present inventors conducted intensive studies and found that by forming a compound [(W, Mo, V, V, Nb) (BCN)] layer and TiCrAlSi (CN) layer layer structure, so as to obtain a film with sliding properties under higher surface pressure, specifically a film with both low friction and wear resistance. That is, by using (W, Mo, V, Nb) (BCN) compounds, due to frictional heat generation and surface pressure during sliding, a friction reaction occurs to form oxides of W, Mo, V, and Nb with low melting points, thereby A low coefficient of friction is obtained. However, there is a problem that these monomers rapidly oxidize especially when used at a high temperature, which increases wear. Therefore, by combining with TiCrAlSi(CN) which is excellent in oxidation resistance, that is, by forming a laminated structure, the rapid progress of oxidation can be suppressed even at high temperature, and a low friction coefficient can be obtained.

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention provides a hard film and a hard film covering material, which have better abrasion resistance, a lower coefficient of friction, and better sliding properties than conventional surface covering layers. The film layer A composed of M(BaCbN1-a-b) satisfies the following formulas (1A) to (2A), and the film layer B composed of Ti1-x-yCrxAlySiz (C1-ANA) satisfies the following formula (1B) ~(5B), hard coatings etc. (wherein, the above-mentioned M is one or more of W, V, Mo, and Nb, each of which has a layer thickness of 5 to 100 nm, and is laminated, and in the following formula, a represents B) Atomic ratio, b represents the atomic ratio of C, x represents the atomic ratio of Cr, y represents the atomic ratio of Al, z represents the atomic ratio of Si, and A represents the atomic ratio of N.). 0≤a≤0.3 formula (1A); 0≤b≤0.5 formula (2A); 0≤1-x-y≤0.5 formula (1B); 0≤x≤0.5 formula (2B); 0.4≤y≤0.7 formula (3B); 0≤z≤0.15 formula (4B); 0.5≤A≤1 formula (5B).

Description

technical field [0001] The present invention belongs to the technical field related to hard film and hard film covering material. Background technique [0002] At present, metallurgical tools for metal processing such as molds have been improved in wear resistance and seizing resistance by nitriding treatment. In recent years, the improvement of wear resistance and seizing resistance by vapor phase coating such as PVD is being studied instead of nitriding treatment. For example, JP-A-2000-144376 discloses that sliding properties are improved by forming a composite nitride containing two or more types of Cr, Al, Ti, and V. In JP-A-2002-307128 and JP-A-2002-307129, it is disclosed that one or more nitrides, carbides, and carbonitrides of Ti, V, Al, Cr, and Si are formed, or, furthermore, here Basically, a sulfide layer containing Ti and Cr and composed of residual Mo is formed, which is excellent in wear resistance or sintering resistance. In JP-A-2000-1768, it is disclosed...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B32B33/00C23C14/06
Inventor 山本兼司
Owner KOBE STEEL LTD