Super resolution lithography method based on PDMS template and silver board material

Abstract

The utility model relates to a super-resolution photolithography method based on the PDMS template and the silver plate material, which comprises the following steps: a metallic film layer which has week adhering capability on a base is vapor-plated on the surface of the base; a micro-nano target structure is produced on the metallic film surface; after mixed with the curing agent, the PDMS is cast on the surface of the metallic film layer; the mixture is solidified in the environment with temperature of 25 to 95 DEG C to generate an elastic film; the PDMS film is lifted and the metallic film layer adhered on the surface of the PDMS film is removed, and then the micro-nano target structure is embedded in the PDMS film; a protective layer with the thickness of 10 to 100nm is spin-coated on the PDMS surface to form a super-resolution photoetching mask; the photoresist is spread on the surface of another substrate, on which a silver layer with the thickness of 10 to 100nm is vapor-plated; the figure surface of the super-resolution photoetching mask is accurately attached with the silver layer on the photoresist surface and then the super-resolution photoetching mask and the silver film are removed through exposure, and the photoresist is developed; and then the required target figure is formed. The utility model not only improves the resolution greatly, decreases the complexity of the traditional photolithography method, but also utilizes the elasticity of the PDMS material and realizes the micro-nano structure molding on the curved surface of the material.

Description

technical field [0001] The invention belongs to the technical field of micro-nano structure processing, in particular to a super-resolution photolithography method based on a PDMS template and a silver plate material. Background technique [0002] In recent years, with the rapid development of micro-nano processing technology and nanomaterials, the electromagnetic properties of micro-nano metal structures are receiving more and more attention. The interaction of light with surface micro-nano metal structures produces a series of new and exotic physical phenomena. For example, in 1998, French scientist Ebbesen and his collaborators discovered the phenomenon of extraordinary enhancement (Extraordinary Optical Transmission) of light passing through a subwavelength metal hole array. The research of H.J.Lezec et al. further showed that: when the light passes through the sub-wavelength metal nanohole, its transmittance can not only be enhanced, but also the diffraction angle of t...

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a super-resolution photolithography method based on PDMS templates and silver plate materials, which realizes practical The batch production of micro-nano structures is suitable for the preparation of various scale structures from tens of nanometers to millimeters, which not only greatly improves the resolution, but also reduces the complexity of traditional photolithography

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