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Dry dust removing method by using inorganic chlorosilane gas and device thereof

An organochlorosilane, dry dust removal technology, used in organic chemistry, organic silicon compounds, chemical instruments and methods, etc.

Inactive Publication Date: 2008-03-26
JIANGXI BLUESTAR XINGHUO SILICONE CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a continuous drying method for organochlorosilane gas with high dust removal efficiency, low energy consumption, high product recovery rate and simple process flow, aiming at the shortcomings of the organochlorosilane gas wet dedusting method in the prior art. Type dust removal method and device using the method

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  • Dry dust removing method by using inorganic chlorosilane gas and device thereof

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Embodiment Construction

[0023] The present invention will be described in further detail below in conjunction with the embodiments and the accompanying drawings.

[0024] The following examples are non-limiting examples of the invention.

[0025] The organochlorosilane synthesis gas is high-temperature methylchlorosilane synthesis gas, and the liquid organochlorosilane used as the backflushing gas is liquid monochloromethane.

[0026] As shown in FIG. 1 , the organochlorosilane dry dust removal device of the present invention includes an evaporator 3 , a superheater 4 and a ceramic filter 2 which are connected in sequence. The valve at the bottom of the filter is a rotary valve, and below the rotary valve is a dust storage tank.

[0027] At first, after the high-temperature synthesis gas from the methylchlorosilane synthesis fluidized bed reactor is carried out preliminary dedusting through the primary cyclone 1, it is made to enter the ceramic filter 2 for dedusting again, and the purified methylch...

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Abstract

The present invention relates to dry dedusting process and apparatus for organic chlorosilane gas. The dry dedusting process includes the following steps: 1. filtering dusty high temperature organic chlorosilane gas to dedust; 2. pressurizing and evaporating liquid organic chlorosilane gas for generating back blowing gas, heating organic chlorosilane vapor and regulating flow rate; and 3. feeding the heated organic chlorosilane gas to the filter to eliminate dust in the filter through back blowing. The dry dedusting apparatus includes one evaporator, one heater and one ceramic filter connected successively. The present invention has high dedusting efficiency, low power consumption, high product recovering rate and simple process.

Description

technical field [0001] The invention relates to a method and a device for dry dust removal of organic chlorosilane gas. Background technique [0002] In domestic and foreign patents and literature, there are not many reports on the method and equipment of organochlorosilane gas dedusting. Chinese Patent Application Publication No. CN1438226A discloses a method for wet dust removal and high-boiling separation of organochlorosilane gas. The process uses organochlorosilane liquid as a washing liquid, and the dust in the gas is removed in a washing tower, and the washing liquid and silicon The liquid and solid impurities such as powder overflow from the tower kettle to the tower kettle re-evaporator, and the liquid level of the re-evaporator is controlled by the two-position switch at the bottom of the re-evaporator. The kettle liquid is discharged into the flash tank, and the flashed gas enters the flash condenser. Condensation is carried out, the condensate enters the high bo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F7/12C07F7/20
Inventor 郭守涛程红斌李恩清邱玲陈晓明章应斌李辉
Owner JIANGXI BLUESTAR XINGHUO SILICONE CO LTD
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