Vertical type bipolar transistor manufacture method and vertical type bipolar transistor
A technology of bipolar transistors and manufacturing processes, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of high manufacturing cost, complicated process, and complicated manufacturing technology, and achieve lower precision requirements, lower costs, The effect of process simplification
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[0012] The preparation method of the vertical bipolar transistor of the present invention adopts a D-shaped sidewall structure and a self-aligning process to form the emitter of a small-size vertical bipolar transistor. The D-shaped sidewall is also used to isolate the external Base and emitter. The specific process flow is as follows:
[0013] First, a layer of polysilicon is deposited on the P-type silicon substrate, and a thicker (about 2000 angstroms) oxide film is deposited on the polysilicon layer (see FIG. 1). The deposition method can adopt common chemical vapor deposition or other methods to form the polysilicon layer. The specific methods for forming the polysilicon layer, the nitride film layer, etc., described in the following steps of the present invention can be achieved by various methods known in the prior art.
[0014] The ion implantation area is formed by photolithography and etching, and the ion implantation area is used as the emission area of the preset ver...
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