Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A dual-mode ellipse response filter of substrate integration waveguide

A substrate-integrated waveguide and filter technology, applied to waveguide devices, connection devices, electrical components, etc., can solve problems such as difficult implementation and complex design, and achieve convenient grounding and isolation, simple design, and high no-load quality factor Effect

Inactive Publication Date: 2011-02-09
SOUTHEAST UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is complex in design and difficult to implement.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A dual-mode ellipse response filter of substrate integration waveguide
  • A dual-mode ellipse response filter of substrate integration waveguide
  • A dual-mode ellipse response filter of substrate integration waveguide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The dual-mode cavity elliptic response filter uses two dual-mode single cavities with different sizes to obtain an elliptic response with bilateral steep drops, and each single cavity contributes one zero point and two poles. A single-chamber structure such as figure 1 As shown, it adopts the substrate integrated waveguide technology, including the dielectric substrate 1, the upper surface metal layer 7 and the lower surface metal layer 8 applied on the upper and lower surfaces of the dielectric substrate 1, and the upper and lower metal layers that penetrate the upper and lower metal surfaces. The surface metal layer 7 and the metallized through-hole array 2 of the lower surface metal layer 8 . The cavity 3 with a rectangular structure is a standard rectangular structure, and the first inductive coupling hole 61 and the second inductive coupling hole 62 lead energy into and out of the cavity. The first metallized through-hole array 4 and the second metallized through-...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a substrate integrated waveguide dual-mode elliptical response filter, which adopts two dual-mode single chambers with different sizes, the upper surface and the lower surface of a medium substrate (1) are respectively coated with an upper surface metal layer (7) and a lower surface metal layer (8), a metallizing through hole array (2) penetrates the medium substrate (1),the upper surface metal layer (7) and the lower surface metal layer (8), a cavity (3) with a rectangular structure is formed by the surrounding of the metallizing through hole array (2), the relativetwo sides of the cavity (3) with the rectangular structure are respectively provided with a first inductive coupling hole (61) and a second inductive coupling hole (62) for the leading-in and the leading-out of energy into and out of the cavity; a first metalizing through hole array (4) and a second metalizing through hole array (5) are respectively arranged at the outsides of the first inductivecoupling hole (61) and the second inductive coupling hole (62) to be corresponding to the input and the output of the cavity of the filter, the two are distributed in a common line and are connected to an external circuit to be connected to a micro-strip line or other substrate integrated waveguide devices.

Description

technical field [0001] The invention relates to a millimeter wave filter, which is realized by using a substrate integrated waveguide (Substrate Integrated Waveguide SIW) dual-mode cavity, has the characteristics of an elliptical response, and is especially suitable for high frequency, low loss, high integration, and for Applications with high selectivity requirements. Background technique [0002] The filter is one of the important basic unit circuits of the circuit system, and its performance has an important impact on the overall selectivity, noise figure, gain, and sensitivity of the system. Commonly used in microwave and millimeter wave circuits are filters based on metal waveguides and filters based on planar circuits such as microstrip lines and coplanar lines. Filters based on metal waveguides usually have the advantages of high Q value, low loss, and good selectivity, but they require high processing precision, high cost, large volume, and are difficult to integrat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01P1/207H01P5/08H01P1/20
Inventor 董元旦洪伟
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com